Method and system for combined photothermal modulated reflectance and photothermal IR radiometric system
First Claim
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1. An apparatus for evaluating characteristics of a sample comprising:
- a probe source which emits a probe beam of radiation which is incident upon the sample, and reflected off the sample;
an intensity modulated energy source which supplies intensity modulated energy to the sample, wherein in response to the intensity modulated energy a reflectivity of the sample changes, and wherein in response to the intensity modulated energy infrared radiation emitted by the sample changes;
a photodetector which detects changes in said reflected probe beam, where changes in the reflected probe beam result from the variations in the reflectivity of the sample;
an infrared detector which detects the changes in the infrared radiation emitted from the sample; and
a processor system coupled to the photodetector for analyzing changes in the reflected probe beam to evaluate characteristics of the sample, and the processor system coupled to the infrared detector, wherein the processor system analyzes the changes in the infrared radiation to evaluate characteristics of the sample.
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Abstract
A method and apparatus for evaluating a semiconductor wafer. A combination of a photothermal modulated reflectance method and system with a photothermal IR radiometry system and method is utilized to provide information which can be used to determine properties of semiconductor wafers being evaluated. The system and method can provide for utilizing a common probe source and a common intensity modulated energy source. The system and method further provide an infrared detector for monitoring changes in infrared radiation emitted from a sample, and photodetector for monitoring changes in beam reflected from the sample.
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Citations
14 Claims
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1. An apparatus for evaluating characteristics of a sample comprising:
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a probe source which emits a probe beam of radiation which is incident upon the sample, and reflected off the sample;
an intensity modulated energy source which supplies intensity modulated energy to the sample, wherein in response to the intensity modulated energy a reflectivity of the sample changes, and wherein in response to the intensity modulated energy infrared radiation emitted by the sample changes;
a photodetector which detects changes in said reflected probe beam, where changes in the reflected probe beam result from the variations in the reflectivity of the sample;
an infrared detector which detects the changes in the infrared radiation emitted from the sample; and
a processor system coupled to the photodetector for analyzing changes in the reflected probe beam to evaluate characteristics of the sample, and the processor system coupled to the infrared detector, wherein the processor system analyzes the changes in the infrared radiation to evaluate characteristics of the sample. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for evaluating characteristics of a semiconductor sample comprising:
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generating intensity modulated energy from an intensity modulated energy source;
directing the intensity modulated energy from the intensity modulated energy source to the surface of the sample, wherein the intensity modulated energy causes changes in an infrared radiation emitted from the sample, and changes in a reflectivity of the sample;
directing a probe beam from a probe source such that it is incident upon the sample, and reflected off the sample;
monitoring changes in the reflected probe beam resulting from the changes in the reflectivity of the sample;
analyzing the monitored changes of the reflected probe beam to evaluate the sample;
monitoring the changes in the infrared radiation emitted from the sample; and
analyzing the monitored changes in the infrared radiation emitted by the sample to evaluate the sample. - View Dependent Claims (11, 12, 13, 14)
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Specification