Method for producing coated workpieces, uses and installation for the method
First Claim
1. A system for implementing a method for producing workpieces coated by PECVD with a quality sufficient for epitaxy, comprising a vacuum recipient, a plasma discharge source operationally connected to said vacuum recipient so as to generate in said vacuum recipient a low voltage plasma discharge not of the cathode spot forming-type, a workpiece holder within said vacuum recipient, said plasma discharge source being configured to generate on said workpiece holder ions with an energy of below 15 eV, a heater for a substrate deposited on said workpiece holder, said heater being configured to be independently controllable from said plasma discharge source, a gas feed to said vacuum recipient from a gas tank containing a reactive gas, and a turbo-molecular pump operationally connected to said vacuum recipient to provide for a pressure in said vacuum recipient in a low pressure range suitable for epitoxial-coating quality.
1 Assignment
0 Petitions
Accused Products
Abstract
A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.
-
Citations
40 Claims
- 1. A system for implementing a method for producing workpieces coated by PECVD with a quality sufficient for epitaxy, comprising a vacuum recipient, a plasma discharge source operationally connected to said vacuum recipient so as to generate in said vacuum recipient a low voltage plasma discharge not of the cathode spot forming-type, a workpiece holder within said vacuum recipient, said plasma discharge source being configured to generate on said workpiece holder ions with an energy of below 15 eV, a heater for a substrate deposited on said workpiece holder, said heater being configured to be independently controllable from said plasma discharge source, a gas feed to said vacuum recipient from a gas tank containing a reactive gas, and a turbo-molecular pump operationally connected to said vacuum recipient to provide for a pressure in said vacuum recipient in a low pressure range suitable for epitoxial-coating quality.
Specification