Method for producing high-structure area texturing of a substrate, substrates prepared thereby and masks for use therein

• US 6,919,162 B1
• Filed: 01/19/1999
• Issued: 07/19/2005
• Est. Priority Date: 08/28/1998
• Status: Expired due to Fees

• Current Assignee: Agilent Technologies, Inc.
• Original Assignee: Agilent Technologies, Inc.
• Inventors: Swedberg, Sally A., Brennen, Reid A.
• Primary Examiner(s): Young, Christopher G.
• Application Number:
  US09/233,694
• Time in Patent Office: 2,373 Days
• Field of Search: 430/272.1, 430/275.1, 430/302, 430/311, 430/313, 430/314, 430/322, 430/323, 219/121.66, 219/121.68, 219/121.69
• US Class Current: 430/272.1
• CPC Class Codes: B23K 2103/42 Plastics B23K2103/16 takes precedence
• CPC Class Codes: B23K 2103/50 Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
• CPC Class Codes: B23K 2103/52 Ceramics
• CPC Class Codes: B23K 26/066 by using masks
• CPC Class Codes: B23K 26/355 Texturing
• CPC Class Codes: B23K 26/361 for deburring or mechanical trimming B23K26/351 takes precedence
• CPC Class Codes: B23K 26/40 taking account of the properties of the material involved
• CPC Class Codes: B41M 5/24 Ablative recording, e.g. by burning marks; Spark recording marking by high energetic means, e.g. by laser otherwise than burning or ablative removal B41M5/26; materials or methods for recording or reproduction by optical means G11B7/00
• CPC Class Codes: G01N 30/6095 Micromachined or nanomachined, e.g. micro- or nanosize
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

A method is provided for preparing high-surface area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High-surface area textured substrates, in particular, miniaturized planar analysis devices having high-surface area textured features, prepared by the methods disclosed herein are also provided. A method by which the high-surface area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

Claims

1. A substrate comprising:

a material selected from the group consisting of polymeric materials, ceramic materials, glass materials, metal materials, and composites thereof; and

a surface having features formed by the treatment of a surface-altering process that utilizes a partially transmissive mask that allows a fraction of light to pass therethrough, the surface area of the treated surface being greater than the surface area of an untreated surface.

2. The substrate of claim 1, wherein the surface area of the treated surface is at least 1,000 times greater than the surface area of an untreated surface.

3. The substrate of claim 1, wherein the material comprises a polyimide.

4. An analysis device comprising the substrate of claim 1.