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Display device and method of manufacturing the same

  • US 6,919,933 B2
  • Filed: 03/22/2002
  • Issued: 07/19/2005
  • Est. Priority Date: 03/30/2001
  • Status: Expired due to Term
First Claim
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1. A display device comprising:

  • a semiconductor layer formed on an insulating substrate like an island;

    a first gate electrode of a first MOS transistor formed on the semiconductor layer via a gate insulating film;

    a second gate electrode of a second MOS transistor formed on the semiconductor layer via the gate insulating film at a distance from the first gate electrode;

    first and second one conductivity type impurity introduced regions formed in the semiconductor layer on both sides of the first gate electrode to serve as source/drain of the first MOS transistor; and

    first and second opposite conductivity type impurity introduced regions formed in the semiconductor layer on both sides of the second gate electrode to serve as source/drain of the second MOS transistor, whereby one of the first and second opposite conductivity type impurity introduced regions is formed to mutually contact the second one conductivity type impurity introduced region, wherein the second one conductivity type impurity introduced region and the first opposite conductivity type impurity introduced region that contacts the second one conductivity type impurity introduced region are formed to engage alternatively along extending directions of the first and second gate electrodes, and a boundary portion between the second one conductivity type impurity introduced region and the first opposite conductivity type impurity introduced region is extended like the teeth of a comb.

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