Direct write lithography system

• US 6,919,952 B2
• Filed: 03/19/2003
• Issued: 07/19/2005
• Est. Priority Date: 03/19/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Mapper Lithography IP B.V (ASML Holding NV)
• Inventors: Kruit, Pieter
• Primary Examiner(s): FULLER, RODNEY EVAN
• Application Number:
  US10/391,956
• Publication Number:
  US 20030219572A1
• Time in Patent Office: 853 Days
• Field of Search: 355/67, 355/68, 250/492.2, 250/492.3
• US Class Current: 355/67
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: H01J 2237/31774 Multi-beam
• CPC Class Codes: H01J 2237/31777 by projection
• CPC Class Codes: H01J 2237/31779 from patterned photocathode
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe
• CPC Class Codes: Y10S 438/942 Masking
• CPC Class Codes: Y10S 438/949 Energy beam treating radiation resist on semiconductor
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Abstract

The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has an activation area. Individually controllable light sources are included where each light source is arranged for activating one electron source. A Controller controls each light source individually and each electron beam is focused on an object plane with a diameter smaller than the diameter of an individually controllable light source.

Claims

1. A mask-less lithography system comprising:

A converter comprising an array of light controllable electron sources, each electron source being arranged for converting light into an electron beam, each electron source having an activation area;

A plurality of individually controllable light sources, each light source arranged for activating one electron source;

Controller means for controlling each light source individually;

Focussing means for focussing each electron beam on an object plane and with a diameter smaller than the diameter of an individually controllable light source.

2. The lithography system of claim 1, wherein the focussing means are adapted for focussing each electron beam on said object plane with a diameter smaller than said activation area of a electron source.

3. The lithography system of claim 1, further comprising first scanning means for scanning the electron beams in a first scan direction.

4. The lithography system of claim 3, further comprising displacement means for moving the object plane and the converter with regard to each other in a second scan direction which second scan direction is at an angle between 0 and 180 degrees with the first scan direction.

5. The lithography system according to claim 4, wherein the first scan direction is substantially perpendicular to the second scan direction.

6. The lithography system according to claim 1, wherein the converter is arranged for being activated by individual light sources, each light source adapted for producing a light spot with a diameter of about 200-2000 nm on an electron source, each electron source adapted for producing an electron beam with a diameter smaller than about 100 nm, preferably smaller than about 40 nm, on said object plane.

7. The lithography system according to claim 3, wherein the first scanning means comprise magnetical means for sweeping the electron beams in the first scan direction.

8. The lithography system according to claim 4, wherein the electron sources form an array with columns and rows of electron sources, and the second scan direction is at an angle unequal to zero with one of the columns and rows.

9. The lithography system according to claim 8, wherein said angle is between about 0.1 to about 15 degrees.

10. The lithography system according to claim 1, wherein the individually controllable light sources comprise light emitting diodes, said light emitting diodes forming an array of light emitting diodes.

11. The lithography system according to claim 1, further comprising means for directing the light from one light source to one activation area of the converter.

12. The lithography system according to claim 11, wherein each individually controllable light source comprises an optical fiber, the optical fibers having a first end directed to an activation area and a second end arranged for receiving light from a light emitting element.

13. The lithography system of claim 12, wherein each individually controllable light source further comprises a semiconductor laser, each semiconductor laser arranged for coupling its light into one of the optical fibers.

14. The lithography system of claim 1, wherein said electron sources have at least an element distance between each two adjacent electron sources.

15. The lithography system according to any one of the preceding claims, wherein each electron source comprises a field emitter.

16. The lithography system according to claim 1, wherein each individually controllable light sources comprise projecting means for projecting a light spot on one activation area, and said focussing means are adapted for focussing each electron beam on said object plane and with a diameter smaller than the diameter of said light spot.

19. A semiconductor element, processed using a lithography system according to any one of claims 1-16 and 18.

20. A method for processing a substrate using a lithography system according to any one of claims 1-16 and 18.

17. A method of producing a pattern on a substrate, wherein data is retrieved from a data storage means on at least one computer system, said data representing the pattern to be produced on said substrate, said data is processed in said computer and converted into signals activating and deactivating individually controllable light sources, and said individually controllable light sources are projected on a converter comprising a plurality of electron sources arranged for converting light into an electron beam, each electron source having one activation area, each individually controllable light source producing a light spot on one activation area.

18. A direct write lithography system comprising:

A converter comprising an array of light controllable field emitters, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each field emitter having an activation area;

A plurality of individually controllable light sources, each light source arranged for activating one field emitter;

Controller means for controlling each light source individually;

Focussing means for focussing each electron beam from the field emitters with a diameter smaller than the diameter of a light source on an object plane.