Process for producing integrated circuits including reduction using gaseous organic compounds
First Claim
1. A process for producing an integrated circuit comprising at least partially reducing a metal oxide layer to an elemental metal with a gaseous organic compound selected from the group consisting of:
- (a) organic compounds comprising at least one alcohol (—
OH) group and selected from the group consisting of primary alcohols, secondary alcohols, tertiary alcohols, polyhydroxy alcohols, cyclic alcohols, aromatic alcohols, halogenated alcohols and other derivatives of alcohols;
(b) organic compounds comprising at least one aldehyde (—
CHO) group and selected from the group consisting of;
(i) compounds having the general formula (V)
R3—
CHO
(V)
wherein R3 is hydrogen or a linear or branched C1-C20 alkyl or alkenyl group, (ii) compounds having the general formula (VI)
OHC—
R4—
CHO
(VI)
wherein R4 is zero or a linear or branched C1-C20 saturated or unsaturated hydrocarbon, (iii) halogenated aldehydes, and (iv) other derivatives of aldehydes; and
(C) organic compounds comprising at least one carboxylic acid (—
COOH) group and selected from the group consisting of;
(i) compounds having the general formula (VII)
R5COOH
(VII)
wherein R5 is hydrogen or a linear or branched C1-C20 alkyl or alkenyl group, (ii) polycarboxylic acids, (iii) halogenated carboxylic acids, and (iv) other derivatives of carboxylic acids.
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Abstract
This invention concerns a process for producing integrated circuits containing at least one layer of elemental metal which during the processing of the integrated circuit is at least partly in the form of metal oxide, and the use of an organic compound containing certain functional groups for the reduction of a metal oxide layer formed during the production of an integrated circuit. According to the present process the metal oxide layer is at least partly reduced to elemental metal with a reducing agent selected from organic compounds containing one or more of the following functional groups: alcohol (—OH), aldehyde (—CHO), and carboxylic acid (—COOH).
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Citations
30 Claims
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1. A process for producing an integrated circuit comprising at least partially reducing a metal oxide layer to an elemental metal with a gaseous organic compound selected from the group consisting of:
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(a) organic compounds comprising at least one alcohol (—
OH) group and selected from the group consisting of primary alcohols, secondary alcohols, tertiary alcohols, polyhydroxy alcohols, cyclic alcohols, aromatic alcohols, halogenated alcohols and other derivatives of alcohols;
(b) organic compounds comprising at least one aldehyde (—
CHO) group and selected from the group consisting of;
(i) compounds having the general formula (V)
R3—
CHO
(V)
wherein R3 is hydrogen or a linear or branched C1-C20 alkyl or alkenyl group,(ii) compounds having the general formula (VI)
OHC—
R4—
CHO
(VI)
wherein R4 is zero or a linear or branched C1-C20 saturated or unsaturated hydrocarbon,(iii) halogenated aldehydes, and (iv) other derivatives of aldehydes; and
(C) organic compounds comprising at least one carboxylic acid (—
COOH) group and selected from the group consisting of;
(i) compounds having the general formula (VII)
R5COOH
(VII)
wherein R5 is hydrogen or a linear or branched C1-C20 alkyl or alkenyl group,(ii) polycarboxylic acids, (iii) halogenated carboxylic acids, and (iv) other derivatives of carboxylic acids. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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20. The process of claim 38, wherein R1 is selected from the group consisting of methyl, ethyl, propyl, butyl, pentyl and hexyl.
Specification