Off-axis leveling in lithographic projection apparatus

• US 6,924,884 B2
• Filed: 10/14/2003
• Issued: 08/02/2005
• Est. Priority Date: 03/08/1999
• Status: Expired due to Term

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Broodbakker, Petrus Johannes Maria, Zong, Mingcheng, Roijers, Jozef Cornelus Antonius, Boonman, Marcus Emile Joannes, Nijmeijer, Gerrit Johannes
• Primary Examiner(s): Kim, Peter B.
• Application Number:
  US10/683,454
• Publication Number:
  US 20040130691A1
• Time in Patent Office: 658 Days
• Field of Search: 355/55, 355/53, 355/72, 355/75, 356/399, 356/400, 356/401, 310/12
• US Class Current: 355/55
• CPC Class Codes: G03F 9/70 for microlithography measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775
• CPC Class Codes: G03F 9/7026 Focusing
• CPC Class Codes: G03F 9/7034 Leveling
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Abstract

In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.

Claims

1. A lithographic projection apparatus comprising:

an illumination system constructed and arranged to irradiate at least a portion of a reflective mask

a first movable support constructed and arranged to hold said reflective mask, and having a physical reference surface fixed thereon;

a second support constructed and arranged to hold a substrate;

a projection system constructed and arranged to image the irradiated portion of the reflective mask onto a target portion of the substrate;

a positioning system constructed and arranged to move said first support between an exposure station, at which said projection system can image said mask portion onto said substrate, and a measurement station;

a height mapping system located at said measurement station comprising at least one sensor constructed and arranged both to measure positions of a plurality of points on a surface of said mask in a first direction substantially perpendicular to said surface and to measure a position of said physical reference surface in said first direction, said lithographic apparatus constructed and arranged to create a height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask;

a position measuring system located at said exposure station constructed and arranged to measure a position of said physical reference surface in said first direction, after movement of said first support to said exposure station; and

a position controller constructed and arranged to control a position of said first support in at least said first direction, during exposure of said target portion, in accordance with said height map and said position measured by said position measuring system.

2. An apparatus according to claim 1, wherein said controller is further arranged to control a tilt of said first support about at least one axis perpendicular to said first direction in accordance with said height map.

3. An apparatus according to claim 1, wherein said sensor comprises a level sensor constructed and arranged to simultaneously measure positions in said first direction of a linear array of points.

4. An apparatus according to claim 1, wherein said sensor comprises a level sensor constructed and arranged to measure a position of a measurement beam reflected by at least one of said surface and said physical reference surface whose position in said first direction is to be measured.

5. An apparatus according to claim 4, wherein said level sensor comprises:

a projection grating;

projection optics constructed and arranged to project an image of said projection grating onto said at least one of said surface and said physical reference surface whose position in said first direction is to be measured;

a detection grating;

detection optics constructed and arranged to focus light reflected by said at least one of said surface and said physical reference surface to form on said detection grating an image of said projection grating; and

a detector constructed and arranged to detect Moiré

patterns formed by an overlay of said image of said projection grating on said detection grating.

6. An apparatus according to claim 5, wherein said level sensor further comprises a radiation source or illuminator constructed and arranged to illuminate said projection grating with polychromatic radiation and wherein said projection optics and said detection optics comprise reflective optical elements.

7. An apparatus according to claim 6, wherein said level sensor further comprises a filter configured to block a portion of said polychromatic radiation having a wavelength greater than 950 nm.

8. An apparatus according to claim 1, wherein said height mapping system comprises a first sensor constructed and arranged to detect at least one of the positions of said plurality of points on the surface of said mask and the position of said physical reference surface and a second sensor constructed and arranged to detect a position in said first direction of said first support substantially simultaneously with measurements by said first sensor.

9. An apparatus according to claim 8, wherein said second sensor comprises an interferometer.

10. An apparatus according to claim 1, wherein said position measuring system is constructed and arranged to measure the position of said physical reference surface relative to the focal plane of said projection system.

11. An apparatus according to claim 1, wherein:

said first support has a plurality of spaced-apart physical reference surfaces; and

said lithographic apparatus is constructed and arranged to create the height map relative to a reference plane defined by said plurality of physical reference surfaces.

12. An apparatus according to claim 1, further comprising:

a height mapping system located at said exposure station constructed and arranged to measure positions of a plurality of points on a surface of a mask in a direction substantially perpendicular to said surface, said lithographic apparatus constructed and arranged to create a height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask; and

a height calibrator constructed and arranged to compare height maps of said mask prepared by each of said height mapping systems to derive a relative calibration for separate position detection systems provided at said measurement and exposure stations.

13. An apparatus according to claim 8, wherein the measurement by said second sensor is made at a substantially same position in a plane substantially perpendicular to said first direction as the measurement by said first sensor.

14. Apparatus according to claim 13, wherein:

said height mapping system located at said measurement station comprises a confidence sensor constructed and arranged to measure the positions in a direction substantially perpendicular to the substrate of the same plurality of points on the surface of the substrate as measured by the height mapping system located at said exposure station; and

said lithographic apparatus is constructed and arranged to create the height map used for comparison by the height calibrator, said height map created, relative to said physical reference surface, from said positions of the plurality of points on the surface of the substrate measured by the confidence sensor.

15. An apparatus according to claim 1, wherein said lithographic apparatus is constructed and arranged to calculate from said height map Z, R_x, and R_y position setpoints for said position controller, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

16. An apparatus according to claim 15, wherein said setpoints are calculated using one of a least squares method and a moving focus method.

17. An apparatus according to claim 1, wherein said lithographic apparatus is constructed and arranged to calculate from said height map a sequence of Z, R_x, and R_y position setpoints for said position controller matched to an X-Y scan path of said second object table, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

18. A lithographic projection apparatus comprising:

a first movable support constructed and arranged to hold a mask, and having a physical reference surface fixed thereon;

a second support constructed and arranged to hold a substrate;

a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;

a positioning system constructed and arranged to move said first support between an exposure station, at which said projection system can image said mask portion onto said substrate, and a measurement station;

a height mapping system, located at said measurement station, constructed and arranged to measure positions of a plurality of points on a surface of said mask in a first direction substantially perpendicular to said surface, to measure a position of said physical reference surface in said first direction and to measure a position of said first support in said first direction substantially simultaneously with the measurement of at least one of the positions of the plurality of points on the surface of said mask and the position of said physical reference surface, said lithographic apparatus constructed and arranged to create a height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask;

a position measuring system located at said exposure station constructed and arranged to measure a position of said physical reference surface in said first direction, after movement of said second object table to said exposure station; and

a position controller constructed and arranged to control a position of said first support in at least said first direction, during exposure of said target portion, in accordance with said height map and said position measured by said position measuring system.

19. An apparatus according to claim 18, wherein said height mapping system comprises at least one sensor constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure the position of said physical reference surface.

20. An apparatus according to claim 18, wherein said controller is further arranged to control a tilt of said first support about at least one axis perpendicular to said first direction in accordance with said height map.

21. An apparatus according to claim 18, wherein said height mapping system comprises a level sensor constructed and arranged to measure a position of a measurement beam reflected by at least one of said surface and said physical reference surface whose position in said first direction is to be measured.

22. An apparatus according to claim 21, wherein said level sensor comprises:

a projection grating;

projection optics constructed and arranged to project an image of said projection grating onto said at least one of said surface and said physical reference surface whose position in said first direction is to be measured;

a detection grating;

detection optics constructed and arranged to focus light reflected by said at least one of said surface and said physical reference surface to form on said detection grating an image of said projection grating; and

a detector constructed and arranged to detect Moiré

patterns formed by an overlay of said image of said projection grating on said detection grating.

23. An apparatus according to claim 18, wherein said height mapping system comprises a first sensor constructed and arranged to detect at least one of the positions of said plurality of points on the surface of said mask and the position of said physical reference surface and a second sensor constructed and arranged to detect a position in said first direction of said first support substantially simultaneously with measurements by said first sensor.

24. An apparatus according to claim 23, wherein said first sensor is constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure the position of said physical reference surface.

25. An apparatus according to claim 23, wherein said second sensor comprises an interferometer.

26. An apparatus according to claim 23, wherein the measurement by said second sensor is made at a substantially same position in a plane substantially perpendicular to said first direction as the measurement by said first sensor.

27. An apparatus according to claim 18, wherein said position measuring system comprises an image sensor mounted to said first support and said physical reference surface comprises an upper surface of said image sensor.

28. An apparatus according to claim 18, wherein said position measuring system is constructed and arranged to measure the position of said physical reference surface relative to the focal plane of said projection system.

29. An apparatus according to claim 18, wherein:

said first support has a plurality of spaced-apart physical reference surfaces; and

said lithographic apparatus is constructed and arranged to create the height map relative to a reference plane defined by said plurality of physical reference surfaces.

30. An apparatus according to claim 18, wherein measurements of the position of said first support and of at least one of the positions of the plurality of points on the surface of said mask and the position of said physical reference surface are made at a substantially same position in a plane substantially perpendicular to said first direction.

31. An apparatus according to claim 18, wherein said lithographic apparatus is constructed and arranged to calculate from said height map Z, R_x, and R_y position setpoints for said position controller, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

32. An apparatus according to claim 31, wherein said setpoints are calculated using one of a least squares method and a moving focus method.

33. An apparatus according to claim 18, wherein said lithographic apparatus is constructed and arranged to calculate from said height map a sequence of Z, R_x, and R_y position setpoints for said position controller matched to an X-Y scan path of first support, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

34. A lithographic projection apparatus comprising:

a first movable support constructed and arranged to hold a mask, and having a physical reference surface fixed thereon;

a second support constructed and arranged to hold a substrate;

a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;

a positioning system constructed and arranged to move said first support between an exposure station, at which said projection system can image said mask portion onto said substrate, and a measurement station;

a height mapping system located at said measurement station and constructed and arranged to measure positions of a plurality of points on a surface of said mask in a first direction substantially perpendicular to said surface and to measure at a substantially same position in a plane substantially perpendicular to said first direction positions of said first support in said first direction, said lithographic apparatus constructed and arranged to create a height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask and said positions of said first support;

a position measuring system located at said exposure station constructed and arranged to measure a position of said physical reference surface in said first direction, after movement of said first support to said exposure station; and

a position controller constructed and arranged to control a position of said first support in at least said first direction, during exposure of said target portion, in accordance with said height map and said position measured by said position measuring system.

35. An apparatus according to claim 34, wherein said height mapping system comprises at least one sensor constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure a position of said physical reference surface in said first direction.

36. An apparatus according to claim 34, wherein said controller is further arranged to control a tilt of said first support about at least one axis perpendicular to said first direction in accordance with said height map.

37. An apparatus according to claim 34, wherein said height mapping system comprises a level sensor constructed and arranged to measure a position of a measurement beam reflected by at least one of said surface and said physical reference surface whose position in said first direction is to be measured.

38. An apparatus according to claim 37, wherein said level sensor comprises:

a projection grating;

projection optics constructed and arranged to project an image of said projection grating onto said at least one of said surface and said physical reference surface whose position in said first direction is to be measured;

a detection grating;

detection optics constructed and arranged to focus light reflected by said at least one of said surface and said physical reference surface to form on said detection grating an image of said projection grating; and

a detector constructed and arranged to detect Moiré

patterns formed by an overlay of said image of said projection grating on said detection grating.

39. An apparatus according to claim 34, wherein said height mapping system comprises a first sensor constructed and arranged to detect at least one of the positions of said plurality of points on the surface of said mask and a position of said physical reference surface in said first direction and a second sensor constructed and arranged to detect the positions in said first direction of said first support substantially simultaneously with measurements by said first sensor.

40. An apparatus according to claim 39, wherein said first sensor is constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure the position of said physical reference surface.

41. An apparatus according to claim 39, wherein said second sensor comprises an interferometer.

42. An apparatus according to claim 34, wherein said position measuring system comprises an image sensor mounted to said first support and said physical reference surface comprises an upper surface of said image sensor.

43. An apparatus according to claim 34, wherein said position measuring system is constructed and arranged to measure the position of said physical reference surface relative to the focal plane of said projection system.

44. An apparatus according to claim 34, wherein:

said first support has a plurality of spaced-apart physical reference surfaces; and

said lithographic apparatus is constructed and arranged to create the height map relative to a reference plane defined by said plurality of physical reference surfaces.

45. An apparatus according to claim 34, wherein said lithographic apparatus is constructed and arranged to calculate from said height map Z, R_x, and R_y position setpoints for said position controller, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

46. A apparatus according to claim 45, wherein said setpoints are calculated using one of a least squares method and a moving focus method.

47. An apparatus according to claim 34, wherein said lithographic apparatus is constructed and arranged to calculate from said height map a sequence of Z, R_x, and R_y position setpoints for said position controller matched to an X-Y scan path of said first support, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

48. An apparatus according to claim 34, wherein said height mapping system is constructed and arranged to measure a position of said physical reference surface in said first direction and to measure at a substantially same position in a plane substantially perpendicular to said first direction a position of said first support in said first direction.

49. A lithographic projection apparatus comprising:

a first movable support constructed and arranged to hold a mask, and having a physical reference surface fixed thereon;

a second support constructed and arranged to hold a substrate;

a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;

a positioning system constructed and arranged to move said first support between an exposure station, at which said projection system can image said mask portion onto said substrate, and a measurement station;

a height mapping system located at said measurement station and constructed and arranged to measure positions of a plurality of points on a surface of said mask in a first direction substantially perpendicular to said surface, to measure a position of said physical reference surface in said first direction and to measure at a substantially same position to the measurement of said physical reference surface in a plane substantially perpendicular to said first direction a position of said first support in said first direction, said lithographic apparatus constructed and arranged to create a height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask;

a position measuring system located at said exposure station constructed and arranged to measure a position of said physical reference surface in said first direction, after movement of said first support to said exposure station; and

a position controller constructed and arranged to control a position of said support in at least said first direction, during exposure of said target portion, in accordance with said height map and said position measured by said position measuring system.

50. An apparatus according to claim 49, wherein said height mapping system is constructed and arranged to measure at a substantially same position to the measurement of said plurality of points in a plane substantially perpendicular to said first direction positions of said first support in said first direction, said lithographic apparatus constructed and arranged to create the height map, relative to said physical reference surface, from said positions of the plurality of points on the surface of the mask and said positions of said first support.

51. An apparatus according to claim 49, wherein said height mapping system comprises at least one sensor constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure the position of said physical reference surface in said first direction.

52. An apparatus according to claim 49, wherein said height mapping system comprises a first sensor constructed and arranged to detect at least one of the positions of said plurality of points on the surface of said mask and a position of said physical reference surface in said first direction and a second sensor constructed and arranged to detect the positions in said first direction of said first support substantially simultaneously with measurements by said first sensor.

53. An apparatus according to claim 52, wherein said first sensor is constructed and arranged both to measure the positions of the plurality of points on the surface of said mask and to measure the position of said physical reference surface.

54. An apparatus according to claim 52, wherein said second sensor comprises an interferometer.

55. An apparatus according to claim 49, wherein said position measuring system comprises an image sensor mounted to said first support and said physical reference surface comprises an upper surface of said image sensor.

56. An apparatus according to claim 49, wherein said position measuring system is constructed and arranged to measure the position of said physical reference surface relative to the focal plane of said projection system.

57. An apparatus according to claim 49, wherein:

said first support has a plurality of spaced-apart physical reference surfaces; and

said lithographic apparatus is constructed and arranged to create the height map relative to a reference plane defined by said plurality of physical reference surfaces.

58. An apparatus according to claim 49, wherein said lithographic apparatus is constructed and arranged to calculate from said height map Z, R_x, and R_y position setpoints for said position controller, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.

59. An apparatus according to claim 58, wherein said setpoints are calculated using one of a least squares method and a moving focus method.

60. An apparatus according to claim 49, wherein said lithographic apparatus is constructed and arranged to calculate from said height map a sequence of Z, R_x, and R_y position setpoints for said position controller matched to an X-Y scan path of said first support, wherein Z is in said first direction and X and Y are substantially perpendicular to said first direction.