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Formation of discontinuous films during an imprint lithography process

  • US 6,932,934 B2
  • Filed: 07/11/2002
  • Issued: 08/23/2005
  • Est. Priority Date: 07/11/2002
  • Status: Expired due to Term
First Claim
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1. A method of forming a pattern on a substrate, the method comprising:

  • obtaining a patterned template, the patterned template comprising a first surface and a plurality of recesses formed in the patterned template extending from the first surface toward an opposing second surface, where the plurality of recesses define a plurality of features in the first surface of the patterned template;

    applying a predetermined amount of activating light curable liquid to a portion of the substrate;

    positioning the patterned template and the substrate in a spaced relationship to each other so that a gap is created between the patterned template and the substrate, wherein the patterned template is positioned such that the applied activating light curable liquid substantially fills the gap between non-recessed portions of the patterned template and the substrate, and wherein the activating light curable liquid is substantially absent from regions of the substrate approximately below the plurality of recesses of the patterned template; and

    applying an activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid, defining a cured liquid.

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