Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method

• US 6,934,009 B2
• Filed: 05/30/2002
• Issued: 08/23/2005
• Est. Priority Date: 05/31/2001
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Terashi, Takaaki
• Primary Examiner(s): Tso, Laura K.
• Application Number:
  US10/160,218
• Publication Number:
  US 20020196629A1
• Time in Patent Office: 1,181 Days
• Field of Search: 362/268, 355/53, 355/67
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

Abstract

There is provided an illumination apparatus including an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane of mask or reticle on which a pattern is draw, a position of an incidence plane of the optical integrator and a position of the plane to be illuminated being arranged optically conjugate with each other, and a device for forming an optical characteristic distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby different areas on the plane of plane to be illuminated can be illuminated under different illumination conditions.

Claims

1. An illumination apparatus comprising:

an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane to be illuminated, an incidence plane of each said multiple optical systems and the plane to be illuminated being arranged optically conjugate with each other; and

a device for forming polarization distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby the different areas on the plane to be illuminated may be illuminated under different polarization conditions.

2. An illumination apparatus according to claim 1, wherein said device comprises a member that includes a polarizing pattern for forming the polarization distribution.

3. An illumination apparatus according to claim 1, wherein the multiple optical systems in said optical integrator each includes a rod type biconvex lens.

4. A projection exposure apparatus comprising:

an illumination apparatus for illuminating a mask or reticle; and

a projection optical system for projecting a pattern of the mask or reticle onto an object,

wherein said illumination apparatus comprising;

an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating the mask or reticle, an incidence plane of each said multiple optical system and the mask or reticle being optically conjugate with each other; and

a device for forming polarization distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby different areas on the plane of the mask or reticle can be illuminated under different polarization conditions.

5. A projection exposure apparatus according to claim 4, wherein the different areas form a memory pattern and a logic pattern.

6. A device fabricating method comprising the steps of:

exposing an object using a device pattern and an illumination apparatus comprising an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating mask or reticle on which the device pattern is formed, an incidence plane of each said multiple optical system and the mask or reticle being optically conjugate with each other, and a device for forming polarization distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby different areas on the mask or reticle can be illuminated under different polarization conditions; and

performing a predetermined process for the exposed object.