Anticorrosive vacuum sensor

• US 6,935,181 B2
• Filed: 05/11/2004
• Issued: 08/30/2005
• Est. Priority Date: 03/07/2000
• Status: Expired due to Fees

• Current Assignee: Anelva Corporation (Canon Inc.), Masayoshi Esashi
• Original Assignee: Anelva Corporation (Canon Inc.), Masayoshi Esashi
• Inventors: Miyashita, Haruzo, Esashi, Masayoshi, Kitamura, Yasuyuki
• Primary Examiner(s): OEN, WILLIAM L
• Application Number:
  US10/842,437
• Publication Number:
  US 20040206185A1
• Time in Patent Office: 476 Days
• Field of Search: 737/18, 737/24, 737/06, 361/283.1, 361/283.12, 361/283.3, 361/283.4
• US Class Current: 73/718
• CPC Class Codes: G01L 9/0073 using a semiconductive diaphragm

Abstract

A capacitive vacuum sensor includes an elastic diaphragm electrode and a rigid fixed electrode opposite the elastic diaphragm electrode. An internal space is defined between the elastic diaphragm electrode and the rigid fixed electrode. The elastic diaphragm electrode deflects elastically in response to any change in the pressure of a gas applied on the elastic diaphragm electrode, and the capacitive vacuum sensor is responsive to any change in the capacitance between the elastic diaphragm electrode and the rigid fixed electrode that may occur in accordance with the deflection of the elastic diaphragm electrode so that it can measure the pressure of the gas. The vacuum sensor can include an anticorrosive diaphragm electrode that can resist the corrosive action of the reactive gas when it is exposed to such gas, and can be fabricated by the micromachining technology.

Claims

1. An anticorrosive capacitive vacuum sensor manufactured by the micromachining technique, comprising:

an anticorrosive elastic diaphragm electrode operable to elastically deflect in response to a change in the pressure of a gas applied against said anticorrosive elastic diaphragm electrode, said anticorrosive elastic diaphragm electrode being formed of a chemically stabilized material other than monocrystalline silicon; and

a rigid fixed electrode arranged to face said anticorrosive elastic diaphragm electrode, said anticorrosive elastic diaphragm electrode and said rigid fixed electrode defining a closed space therebetween and being arranged such that a change in the capacitance between said anticorrosive elastic diaphragm electrode and said rigid fixed electrode occurs in response to the deflection of said anticorrosive elastic diaphragm electrode for measuring the pressure of the gas.

2. The anticorrosive capacitive vacuum sensor of claim 1, wherein said anticorrosive elastic diaphragm electrode comprises a thin film formed by a thin film deposition process.

3. The anticorrosive capacitive vacuum sensor of claim 1, further comprising a plurality of rigid fixed electrodes arranged to face said anticorrosive elastic diaphragm electrode.

4. The anticorrosive capacitive vacuum sensor of claim 1, wherein said anticorrosive elastic diaphragm electrode comprises a thin film diaphragm having a tensile stress.

5. The anticorrosive capacitive vacuum sensor of claim 4, wherein said anticorrosive elastic diaphragm electrode contains doped impurities for enhancing the conductivity of said anticorrosive elastic diaphragm electrode.

6. The anticorrosive capacitive vacuum sensor of claim 5, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.

7. The anticorrosive capacitive vacuum sensor of claim 4, further comprising an electrically conductive thin film deposited on a side of said anticorrosive elastic diaphragm electrode so as to face said rigid fixed electrode.

8. The anticorrosive capacitive vacuum sensor of claim 7, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.

9. The anticorrosive capacitive vacuum sensor of claim 4, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.

10. The anticorrosive capacitive vacuum sensor of claim 1, wherein said anticorrosive elastic diaphragm electrode contains doped impurities for enhancing the conductivity of said anticorrosive elastic diaphragm electrode.

11. The anticorrosive capacitive vacuum sensor of claim 10, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.

12. The anticorrosive capacitive vacuum sensor of claim 1, further including an electrically conductive thin film deposited on a side of said anticorrosive elastic diaphragm electrode so as to face said rigid fixed electrode.

13. The anticorrosive capacitive vacuum sensor of claim 12, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.

14. The anticorrosive capacitive vacuum sensor of claim 1, wherein said anticorrosive elastic diaphragm electrode is formed from one of silicon carbide, alumina and aluminum nitride.