Method of cleaning CVD device and cleaning device therefor
First Claim
1. A method of cleaning a CVD apparatus wherein a reactive gas is fed into a reaction chamber and a deposited film is formed on a surface of base material disposed in the reaction chamber, said method comprising:
- converting a fluorinated cleaning gas containing a fluorocompound to plasma using a remote plasma generator after formation of the deposited film on the base material surface, and introducing the plasma cleaning gas into the reaction chamber to thereby remove any by-products sticking to inner parts of the reaction chamber, wherein;
the plasma cleaning gas is directly introduced into the reaction chamber; and
the plasma cleaning gas is introduced into the reaction chamber through a raw-material gas supply path.
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Abstract
A cleaning method for CVD apparatus wherein by-products such as SiO2 and Si3N4 adhered to and deposited on surfaces of the inner wall, electrodes and other parts of a reaction chamber at the stage of film formation can be removed efficiently. Furthermore, the amount of cleaning gas discharged is so small that the influence on environment such as global warming is little and cost reduction can be also attained. After the film formation on a base material surface by the use of CVD apparatus, a fluorinated cleaning gas containing a fluorcompound is converted to plasma by means of a remote plasma generator, and the cleaning gas having been converted to plasma is introduced into a reaction chamber so that any by-products adhered to inner parts of the reaction chamber is removed.
13 Citations
14 Claims
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1. A method of cleaning a CVD apparatus wherein a reactive gas is fed into a reaction chamber and a deposited film is formed on a surface of base material disposed in the reaction chamber, said method comprising:
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converting a fluorinated cleaning gas containing a fluorocompound to plasma using a remote plasma generator after formation of the deposited film on the base material surface, and introducing the plasma cleaning gas into the reaction chamber to thereby remove any by-products sticking to inner parts of the reaction chamber, wherein; the plasma cleaning gas is directly introduced into the reaction chamber; and
the plasma cleaning gas is introduced into the reaction chamber through a raw-material gas supply path. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A cleaning device for a plasma CVD apparatus wherein a reactive gas is fed into a reaction chamber and a deposited film is formed on a surface of base material disposed in the reaction chamber, said cleaning device comprising:
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a remote plasma generator capable of converting a fluorinated cleaning gas containing a fluorocompound to plasma after formation of the deposited film on the base material surface; and
a cleaning gas introduction path for introducing the plasma cleaning gas into the reaction chamber, wherein by-products adhered to inner parts of the reaction chamber are removed by the plasma cleaning gas, and wherein the cleaning gas introduction path includes a first cleaning gas introduction path for directly introducing the plasma cleaning gas into the reaction chamber, and a second cleaning gas introduction path for introducing the plasma cleaning gas into the reaction chamber through a raw-material gas supply path. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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Specification