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System for purifying and removing contaminants from gaseous fluids

  • US 6,939,397 B2
  • Filed: 05/10/2004
  • Issued: 09/06/2005
  • Est. Priority Date: 05/08/2003
  • Status: Active Grant
First Claim
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1. A system for purifying a gaseous fluid comprising:

  • a housing including an inlet and an outlet;

    a hollow cartridge disposed within and removable from the housing, the hollow cartridge including an elongated UV chamber disposed within the hollow cartridge;

    a UV radiation source disposed longitudinally within the UV chamber of the hollow cartridge;

    at least one baffle structure disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber; and

    a fan disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate;

    wherein the dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.

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