System for purifying and removing contaminants from gaseous fluids
First Claim
1. A system for purifying a gaseous fluid comprising:
- a housing including an inlet and an outlet;
a hollow cartridge disposed within and removable from the housing, the hollow cartridge including an elongated UV chamber disposed within the hollow cartridge;
a UV radiation source disposed longitudinally within the UV chamber of the hollow cartridge;
at least one baffle structure disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber; and
a fan disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate;
wherein the dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
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Accused Products
Abstract
A system and corresponding methods for purifying and removing contaminants from gaseous fluids includes a housing including an inlet, an outlet, and an elongated UV chamber disposed within the housing. The UV radiation source is disposed longitudinally within the UV chamber. At least one baffle structure is disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber. In addition, a fan is disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate. The dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
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Citations
43 Claims
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1. A system for purifying a gaseous fluid comprising:
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a housing including an inlet and an outlet;
a hollow cartridge disposed within and removable from the housing, the hollow cartridge including an elongated UV chamber disposed within the hollow cartridge;
a UV radiation source disposed longitudinally within the UV chamber of the hollow cartridge;
at least one baffle structure disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber; and
a fan disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate;
wherein the dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of enhancing purification of a gaseous fluid utilizing a system including a housing, a removable hollow cartridge disposed within the housing and including an elongated UV chamber disposed within the hollow cartridge, a UV radiation source disposed longitudinally within the UV chamber of the hollow cartridge, at least one baffle structure disposed at an upstream location within the housing, and a fan, the method comprising the steps of:
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providing electrical power to the UV radiation source to facilitate generation of UV radiation within the UV chamber;
flowing fluid through the housing and the UV chamber via the fan;
facilitating the generation of turbulence and mixing of fluid flowing into the UV chamber via the baffle structure;
restricting fluid flow through the UV chamber to increase exposure time of the fluid to the UV radiation; and
removing the cartridge from the housing to facilitate at least one of providing a new cartridge within the housing and replacing the UV source within the cartridge. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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39. A system for purifying a gaseous fluid comprising:
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a means for housing an elongated UV chamber;
a means for generating UV radiation disposed longitudinally within the UV chamber;
a means for selectively removing the elongated UV chamber including the means for generating UV radiation from the means for housing the elongated UV chamber;
a means for restricting flow as well as generating a turbulent flow of the gaseous fluid within the UV chamber, the means for restricting being disposed at an upstream location within the means for housing; and
a means for generating a flow of the gaseous fluid through the means for housing;
wherein the dimensions of the UV chamber and the means for generating UV radiation and the means for restricting flow are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
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40. A system for purifying a gaseous fluid comprising:
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a housing including an inlet, an outlet, and an elongated UV chamber disposed within the housing;
a UV radiation source disposed longitudinally within the UV chamber;
a filter disposed between the UV source and the outlet of the housing;
at least one baffle structure disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber; and
a fan disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate;
wherein the dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
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41. A system for purifying a gaseous fluid comprising:
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a housing including an inlet, an outlet, and an elongated UV chamber disposed within the housing;
a UV radiation source disposed longitudinally within the UV chamber, the UV source comprising three elongated UV bulbs arranged at 120°
spaced locations from a central axis defined between and extending parallel to the UV bulbs;
at least one baffle structure disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber; and
a fan disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate;
wherein the dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
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42. A method of enhancing purification of a gaseous fluid utilizing a system including a housing with an elongated UV chamber disposed therein, a UV radiation source disposed longitudinally within the UV chamber, at least one baffle structure disposed at an upstream location within the housing, a filter disposed between the UV source and an outlet of the housing, and a fan, the method comprising the steps of:
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providing electrical power to the UV radiation source to facilitate generation of UV radiation within the UV chamber;
flowing fluid through the housing and the UV chamber via the fan;
facilitating the generation of turbulence and mixing of fluid flowing into the UV chamber via the baffle structure;
restricting fluid flow through the UV chamber to increase exposure time of the fluid to the UV radiation; and
filtering fluid flowing through the housing.
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43. A method of enhancing purification of a gaseous fluid utilizing a system including a housing with an elongated UV chamber disposed therein, a UV radiation source disposed longitudinally within the UV chamber, the UV source including three elongated UV bulbs arranged at 120°
- spaced locations from a central axis defined between and extending parallel to the UV bulbs, at least one baffle structure disposed at an upstream location within the housing, and a fan, the method comprising the steps of;
providing electrical power to the UV radiation source to facilitate generation of UV radiation within the UV chamber;
flowing fluid through the housing, through the UV chamber and around the UV bulbs via the fan;
facilitating the generation of turbulence and mixing of fluid flowing into the UV chamber via the baffle structure; and
restricting fluid flow through the UV chamber to increase exposure time of the fluid to the UV radiation.
- spaced locations from a central axis defined between and extending parallel to the UV bulbs, at least one baffle structure disposed at an upstream location within the housing, and a fan, the method comprising the steps of;
Specification