Unipolar electrostatic quadrupole lens and switching methods for charged beam transport

• US 6,949,895 B2
• Filed: 09/03/2003
• Issued: 09/27/2005
• Est. Priority Date: 09/03/2003
• Status: Active Grant

• Current Assignee: Axcelis Technologies Incorporated
• Original Assignee: Axcelis Technologies Incorporated
• Inventors: DiVergilio, William F., Huang, Youngzhang
• Primary Examiner(s): Wong, Don
• Assistant Examiner(s): Alemu, Ephrem
• Application Number:
  US10/654,168
• Publication Number:
  US 20050045835A1
• Time in Patent Office: 755 Days
• Field of Search: 315/506, 315/505, 315/507, 315/501, 315/500, 250423-427, 250/492.2
• US Class Current: 315/505
• CPC Class Codes: H01J 2237/04735 with electrostatic means
• CPC Class Codes: H01J 2237/04737 radio-frequency quadrupole [RFQ]
• CPC Class Codes: H01J 2237/04924 electrostatic
• CPC Class Codes: H01J 37/12 electrostatic
• CPC Class Codes: H01J 37/153 Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
• CPC Class Codes: H01J 37/3171 for ion implantation plasma immersion ion implantation H01J37/32412

Abstract

A linear acceleration system comprises one or more accelerating stages along an axis and a unipolar electrostatic quadruple lens in series with the one or more accelerating stages. The unipolar electrostatic quadruple lens focuses an ion beam in a direction transverse to the axis. The unipolar electrostatic quadruple lens includes a switching circuit, a first pair of electrodes, and a second pair of electrodes. The switching circuit controllably connects to ground and a first voltage potential. The electrodes of the first pair are located opposite each other and are connected to the switching circuit. The electrodes of the second pair are also located opposite each other and connected to the switching circuit. The second pair of electrodes are biased to a second voltage potential.

Claims

1. An electrostatic quadrupole lens system comprising:

a switching circuit controllably connected to ground and a first voltage potential;

a first pair of electrodes located opposite each other, connected to the switching circuit;

a second pair of electrodes located opposite each other, wherein the first pair of electrodes and the second pair of electrodes are equally spaced about a center point, the second pair of electrodes biased to a second voltage potential.

2. The system of claim 1, wherein the first voltage potential is positive and the second voltage potential is negative.

3. The system of claim 1, wherein the first voltage potential is negative and the second voltage potential is positive.

4. The system of claim 1, wherein the switching circuit is part of a power supply that provides the first voltage potential to the first pair of electrodes.

5. A linear acceleration system comprising:

one or more accelerating stages along an axis of the system; and

a first electrostatic quadrupole lens in series with the one or more accelerating stages that focuses an ion beam in a direction transverse to the axis, wherein the first electrostatic quadrupole lens comprises;

a switching circuit controllably connected to ground and a first voltage potential;

a first pair of electrodes located opposite each other, connected to the switching circuit; and

a second pair of electrodes located opposite each other, wherein the first pair of electrodes and the second pair of electrodes are equally spaced about a center point, the second pair of electrodes biased to a second voltage potential.

6. The system of claim 5, further comprising a second electrostatic quadrupole lens in series with the first electrostatic quadrupole lens, wherein the first lens focuses in a first direction and the second lens focuses in a second direction that is generally perpendicular to the first direction.

7. The system of claim 6, wherein the second electrostatic lens is unipolar.

8. The system of claim 6, wherein the second electrostatic lens is bipolar.

9. The system of claim 5, further comprising a low energy ion beam that travels along the axis and is shaped by the first electrostatic quadrupole lens without a substantial loss of beam current.

10. The system of claim 9, wherein the low energy ion beam is at an energy level of less than about 90 KeV.

11. The system of claim 9, wherein the low energy ion beam is at an energy level of less than about 20 KeV.

12. A method of operating an ion implantation system, comprising:

extracting an ion beam from an ion source;

determining whether a desired ion beam energy is greater than a first threshold; and

configuring a quadrupole lens along a beam path of the ion beam in one of a bipolar configuration or a unipolar configuration based on the determination.

13. The method of claim 12, wherein the quadrupole lens is configured in the unipolar configuration if the desired ion beam energy is less than the first threshold.

14. The method of claim 12, further comprising determining whether the desired beam energy is greater than a second threshold, wherein the second threshold is less than the first threshold.

15. The method of claim 14, wherein the quadrupole lens is configured in the unipolar configuration if the desired ion beam energy is less than the second threshold.

16. The method of claim 15, wherein the quadrupole lens is configured in the unipolar configuration or the bipolar configuration is the desired ion beam energy is greater than the second threshold and less than the first threshold.