Cyclic error compensation in interferometry systems

• US 6,950,192 B2
• Filed: 07/08/2003
• Issued: 09/27/2005
• Est. Priority Date: 07/08/2002
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Primary Examiner(s): Toatley, Jr., Gregory J.
• Assistant Examiner(s): CONNOLLY, PATRICK J
• Application Number:
  US10/616,504
• Publication Number:
  US 20040085545A1
• Time in Patent Office: 812 Days
• Field of Search: 356/498, 356/486, 356/487, 356/492, 356/500, 356/493, 356/517
• US Class Current: 356/498
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02059 Reducing effect of parasitic reflections, e.g. cyclic errors
• CPC Class Codes: G01B 9/0207 Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
• CPC Class Codes: G01B 9/02084 Processing in the Fourier or frequency domain when not imaged in the frequency domain
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

The invention features a method including: (i) providing an interference signal S(t) from two beams derived from a common source and directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time; (ii) providing coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω_Rt+φ(t)+ζ₁), where A₁ and ζ₁ are constants, ω_R is an angular frequency difference between the two beams, and φ(t)=nk{tilde over (L)}(t), with k=2π/λ and λ equal to a wavelength for the beams; (iii) calculating a quadrature signal {tilde over (S)}(t) based on the signal S(t); and (iv) reducing the deviation of S(t) from the ideal expression using an error signal S_ψ(t) generated from the coefficients and error basis functions derived from the signals S(t) and {tilde over (S)}(t).

Claims

1. A method comprising:

providing an interference signal S(t) from two beams directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time;

providing one or more coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), where A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=n/k{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams;

calculating a function of values of the signal S(t); and

reducing the deviation of S(t) from the ideal expression using an error signal S_ψ

(t) generated from the coefficients and one or more error basis functions derived at least in part from the function of values of the signal S(t).

2. The method of claim 1, further comprising directing the two beams along the different paths and measuring the interference signal S(t).

3. The method of claim 2, wherein at least one of the beams is directed to reflect from a movable measurement object before producing the interference signal S(t).

4. The method of claim 3, wherein the beam directed to contact the movable measurement object reflects from the measurement object multiple times before producing the interference signal S(t).

5. The method of claim 3, wherein the beams are directed to reflect from different locations of the movable measurement object before producing the interference signal S(t).

6. The method of claim 1, wherein the errors correspond to spurious beam paths.

7. The method of claim 1, wherein the deviation can be expressed as $\sum _{}^{}$

m,p 

⁢

 

⁢

Am,p⁢

cos⁡

(ω

R⁢

t+mp⁢

φ

⁡

(t)+ζ

m,p),

where p=1, 2, 3 . . . , and m is any integer not equal to p, and where the provided coefficients comprise information corresponding to at least some of A_m,p and ζ

_m,p.

8. The method of claim 1, wherein the interference signal S(t) is provided at a data rate that is an integer multiple of ω

_R/2π

.

9. The method of claim 1, wherein the error basis functions correspond to one or more pairs of sine and cosine functions having an argument whose time-varying component has the form ω

_Rt+(m/p)φ

(t), where p is a positive integer and m is an integer not equal to p.

10. The method of claim 9, wherein the error basis functions correspond to multiple pairs of the sine and cosine functions.

11. The method of claim 10, wherein the error basis functions comprise multiple pairs of the sine and cosine functions from a family of the sine and cosine functions with {(p=1,m=−

1),(p=1,m=0),(p=1,m=2),(p=1,m=3), and (p=2,m=1)}.

12. The method of claim 1, further comprising generating the error signal S_ψ

(t).

13. The method of claim 12, the error signal S_ψ

(t) is generated from a superposition of the error basis functions weighted by the coefficients representative of the errors.

14. The method of claim 1, wherein reducing the deviation comprises subtracting the error signal S_ψ

(t) from the interference signal S(t).

15. The method of claim 1, further comprising determining a value for the optical path difference n{tilde over (L)}(t) from the interference signal S(t) after its deviations are reduced.

16. The method of claim 1, wherein ω

_R>

100·

dφ

(t)/dt.

17. The method of claim 1, wherein ω

_R>

500·

dφ

(t)/dt.

18. The method of claim 1, wherein calculating the function of values of the signal S(t) comprises calculating a quadrature signal {tilde over (S)}(t) based on the signal S(t).

19. The method of claim 18, wherein the error basis functions are derived from the signals S(t) and {tilde over (S)}(t).

20. The method of claim 19, wherein ω

_R is non-zero.

21. The method of claim 20, further comprising:

providing a reference signal S_R(t)=A_R cos(ω

_Rt+ζ

_R), where A_R and ζ

_R are constants; and

calculating a quadrature reference signal {tilde over (S)}_R(t) based on the signal S_R(t),

wherein the error basis functions are derived from the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

22. The method of claim 21, further comprising measuring the reference signal S_R(t) based on an output from a common source of the two beams.

23. The method of claim 19, wherein calculating the quadrature signal {tilde over (S)}(t) comprises calculating the quadrature signal {tilde over (S)}(t) based on the expression $\tilde{S}$

(t)=(cot⁢

 

⁢

ω

M⁢

τ

)⁢

S⁡

(t-2⁢

τ

)-cos⁢

 

⁢

2⁢

ω

M⁢

τ

sin⁢

 

⁢

ω

M⁢

τ

⁢

S⁡

(t-τ

),

where τ

>

0 and ω

_M is an instantaneous rate of change of a phase of the interference signal S(t).

24. The method of claim 23, wherein calculating the quadrature signal {tilde over (S)}(t) further comprises approximating ω

_M according to ω

_M≈

ω

_R+dφ

(t)/dt , where φ

(t) in the expression for ω

_M is determined from the interference signal S(t) assuming the deviation of S(t) from the ideal expression is negligible.

25. The method of claim 23, wherein calculating the quadrature signal {tilde over (S)}(t) further comprises approximating ω

_M according to ω

_M≈

ω

_R.

26. The method of claim 25, wherein calculating the quadrature signal {tilde over (S)}(t) comprises calculating the quadrature signal {tilde over (S)}(t) according to the simplified expression $\tilde{S}$

(t)=13⁡

[S⁡

(t-τ

)+S⁡

(t-2⁢

τ

)]

for τ

=(π

+6π

N)/3ω

_R, where N is a non-negative integer.

27. The method of claim 21, wherein calculating the quadrature reference signal {tilde over (S)}_R(t) comprises calculating the quadrature reference signal {tilde over (S)}_R(t) based on the expression ${\tilde{S}}_R$

(t)=(cot⁢

 

⁢

ω

R⁢

τ

)⁢

SR⁡

(t-2⁢

τ

)-cos⁢

 

⁢

2⁢

ω

R⁢

τ

sin⁢

 

⁢

ω

R⁢

τ

⁢

SR⁡

(t-τ

),

where τ

>

0.

28. The method of claim 27, wherein calculating the quadrature reference signal {tilde over (S)}_R(t) comprises calculating the quadrature reference signal {tilde over (S)}_R(t) according to the simplified expression ${\tilde{S}}_R$

(t)=13⁡

[SR⁡

(t-τ

)+SR⁡

(t-2⁢

τ

)]

for τ

=(π

+6π

N)/3ω

_R, where N is a non-negative integer.

29. The method of claim 19, further comprising generating the error basis functions from the signals S(t) and {tilde over (S)}(t).

30. The method of claim 21, further comprising generating the error basis functions from the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

31. The method of claim 30, wherein the error basis functions are generated from algebraic combinations of the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

32. The method of claim 19, wherein the quadrature signal {tilde over (S)}(t) is calculated from the interference signal S(t) based on prior values of S(t) according to the approximation S(t)≈

S(t−

2π

N/ω

_R), where N is a positive integer.

33. The method of claim 19, wherein the error basis functions used to generate the error signal S_ψ

(t) are derived from prior values of the signals S(t) and {tilde over (S)}(t) according to the approximations S(t)≈

S(t−

2π

N/ω

_R) and {tilde over (S)}(t)≈

{tilde over (S)}(t−

2π

M/ω

_R), where N and M are positive integers.

34. An apparatus comprising a computer readable medium which during operation causes a processor to perform the method of claim 1.

53. A lithography method for use in fabricating integrated circuits on a wafer, the method comprising:

supporting the wafer on a moveable stage;

imaging spatially patterned radiation onto the wafer;

adjusting the position of the stage; and

monitoring the position of the stage using the method of claim 1, 35, or 40.

54. A method fof fabricating integrated circuits, the method comprising the lithography method of claim 53.

55. A lithography method for use in the fabrication of integrated circuits comprising:

directing input radiation through a mask to produce spatially patterned radiation;

positioning the mask relative to the input radiation;

monitoring the position of the mask relative to the input radiation using the method of claim 1, 35, or 40; and

imaging the spatially patterned radiation onto a wafer.

56. A method for fabricating integrated circuits, the method comprising the lithography method of claim 55.

57. A lithography method for fabricating integrated circuits on a wafer comprising:

positioning a first component of a lithography system relative to a second component of a lithography system to expose the wafer to spatially patterned radiation; and

monitoring the position of the first component relative to the second component using the method of claim 1, 35, or 40.

58. A method for fabricating integrated circuits, the method comprising the lithography method of claim 57.

59. A method for fabricating a lithography mask, the method comprising:

directing a write beam to a substrate to pattern the substrate;

positioning the substrate relative to the write beam; and

monitoring the position of the substrate relative to the write beam using the interferometry method of claim 1, 35, or 40.

35. A method comprising:

providing an interference signal S(t) from two beams derived from a common source and directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time;

providing coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), where A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=nk{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams; and

reducing the deviation of S(t) from the ideal expression using an error signal S_ψ

(t) generated from the coefficients and error basis functions derived from the interference signal S(t) based on prior values of S(t) according to the approximation S(t)≈

S(t−

2π

N/ω

_R), where N is a positive integer.

36. The method of claim 35, wherein ω

_R>

100·

dφ

(t)/dt.

37. The method of claim 35, further comprising providing a reference signal S_R(t)=A_R cos(ω

_Rt+ζ

_R), where ω

_R is non-zero and A_R and ζ

_R are constants, and wherein the error basis functions are derived from the signals S(t) and S_R(t).

38. The method of claim 37, wherein the derivation of the error basis functions is based on prior values of S_R(t) according to S_R(t)=S_R(t−

2π

M/ω

_R), where M is a positive integer.

39. An apparatus comprising a computer readable medium which during operation causes a processor to perform the method of claim 35.

40. A method for estimating coefficients representative of one or more errors that cause an interference signal S(t) from two beams derived from a common source and directed along different paths to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths,

where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, t is time, A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=nk{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams,

the method comprising;

calculating a quadrature signal {tilde over (S)}(t) based on the signal S(t); and

calculating an estimate for the coefficients based on the signals S(t) and {tilde over (S)}(t).

41. The method of claim 40, further comprising:

providing a reference signal S_R(t)=A_R cos(ω

_Rt+ζ

_R), where ω

_R is non-zero and A_R and ζ

_R are constants; and

calculating a quadrature reference signal {tilde over (S)}_R(t) based on the signal S_R(t),

wherein the estimate for the coefficients is based on the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

42. The method of claim 40, wherein calculating the estimate for the coefficients comprises generating error basis functions derived from the signals S(t) and {tilde over (S)}(t).

43. The method of claim 41, wherein calculating the estimate for the coefficients comprises generating error basis functions derived from the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

44. The method of claim 43, wherein the error basis functions correspond to one or more pairs of sine and cosine functions having an argument whose time-varying component has the form ω

_Rt+(m/p)φ

(t), where p is a positive integer and m is an integer not equal to p.

45. The method of claim 44, wherein the error basis functions are generated from algebraic combinations of the signals S(t), {tilde over (S)}(t), S_R(t), and {tilde over (S)}_R(t).

46. The method of claim 44, wherein the error basis functions correspond to multiple pairs of the sine and cosine functions.

47. The method of claim 46, wherein the error basis functions comprise multiple pairs of the sine and cosine functions from a family of the sine and cosine functions with {(p=1,m=−

1),(p=1,m=0),(p=1,m=2),(p=1,m=3), and (p=2,m=1)}.

48. The method of claim 42, wherein calculating the estimate for the coefficients comprises low-pass filtering algebraic combinations of the error basis functions and the signals S(t) and {tilde over (S)}(t).

49. The method of claim 43, wherein calculating the estimate for the coefficients comprises low-pass filtering algebraic combinations of the error basis functions and the signals S(t) and {tilde over (S)}(t).

51. The method of claim 49, wherein the low-pass filtering comprises using a Butterworth filter.

52. An apparatus comprising a computer readable medium which during operation causes a processor to perform the method of claim 40.

50. The method of claim wherein 48, the low-pass filtering comprises using a Butterworth filter.

60. An apparatus comprising:

an interferometry system which during operation directs two beams along different paths and provides an interference signal S(t) from the two beams, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time,

wherein imperfections in the interferometry system produce one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), where A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=nk{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams; and

an electronic processor which during operation receives the interference signal S(t) from the interferometry system, receives one or more coefficients representative of the one or more errors, calculates a function of values of the signal S(t), and reduces the deviation of S(t) from the ideal expression using an error signal S_ψ

(t) generated from the coefficients and one or more error basis functions derived at least in part from the function of values of the signal S(t).

63. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

the apparatus of claim 60, 61, or 62 for monitonng the position of the wafer relative to the imaged radiation.

64. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system a radiation source, a mask, a positioning system, a lens assembly, and the apparatus of claim 60, 61, or 62,

wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the apparatus monitors the position of the mask relative to the radiation from the source.

65. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

the apparatus of claim 60, 61, or 62 for monitoring the position of the stage relative to the beam directing assembly.

66. A method for fabricating integrated circuits, the method comprising using the lithography system of claim 63.

67. A method for fabricating integrated circuits, the method comprising using the lithography system of claim 64.

61. An apparatus comprising:

an interferometry system which during operation directs two beams derived from a common source along different paths and provides an interference signal S(t) from the two beams, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time,

wherein imperfections in the interferometry system produce one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), where A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=nk{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams; and

an electronic processor which during operation receives the interference signal S(t) from the interferometry system, receives coefficients representative of the one or more errors, and reduces the deviation of S(t) from the ideal expression using an error signal S_ψ

(t) generated from the coefficients and error basis functions derived from the interference signal S(t) based on prior values of S(t) according to the approximation S(t)≈

S(t−

2π

N/ω

_R), where N is a positive integer.

62. An apparatus comprising:

an interferometry system which during operation directs two beams derived from a common source along different paths and provides an interference signal S(t) from the two beams, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time,

wherein imperfections in the interferometry system produce one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A₁ cos(ω

_Rt+φ

(t)+ζ

₁), where A₁ and ζ

₁ are constants, ω

_R is an angular frequency difference between the two beams, and φ

(t)=nk{tilde over (L)}(t), with k=2π

/λ and

λ

equal to a wavelength for the beams; and

an electronic processor which during operation receives the interference signal S(t) from the interferometry system, calculates a quadrature signal {tilde over (S)}(t) based on the signal S(t), and calculates an estimate for the coefficients representative of the one or more errors based on the signals S(t) and {tilde over (S)}(t).