Brush scrubbing-high frequency resonating wafer processing system and methods for making and implementing the same

• US 6,951,042 B1
• Filed: 02/28/2003
• Issued: 10/04/2005
• Est. Priority Date: 02/28/2003
• Status: Expired due to Fees

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Redeker, Fritz C., Mikhaylichenko, Katrina
• Primary Examiner(s): Kim, John
• Assistant Examiner(s): KARLS, SHAY LYNN
• Application Number:
  US10/377,944
• Time in Patent Office: 949 Days
• Field of Search: 15/77, 15/882, 15/883, 151/02, 15/211, 15/94, 151/035
• US Class Current: 15/77
• CPC Class Codes: B08B 1/32 using rotary cleaning members
• CPC Class Codes: B08B 3/12 by sonic or ultrasonic vibrations washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves A47L15/13; of natural teeth, of prostheses using ultrasonic techniques similar to those used for natural teeth A61C17/20; application of ultrasonic vibrations to chemical, physical or physico-chemical processes in general B01J19/10
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes

Abstract

A substrate cleaning apparatus is provided. The apparatus includes a transducer capable of resonating at a high frequency and a brush material attached to a surface of the transducer. The brush material includes at least one passage extending to the surface of the transducer and is configured to be applied to a surface of a substrate. When the transducer resonates at the high frequency, the transducer is capable of imparting acoustic energy to the surface of the substrate at a location of the at least one passage.

Claims

1. A substrate cleaning apparatus, comprising:

a transducer capable of resonating at a high frequency; and

a brush material attached to a surface of the transducer, the brush material including at least one passage extending to the surface of the transducer, the brush material being configured to be applied to a surface of the substrate, the transducer when resonating at the high frequency being capable of imparting acoustic energy to the surface of the substrate at a location of the at least one passage.

2. A substrate cleaning apparatus as recited in claim 1, wherein the brush material is saturated with a fluid.

3. A substrate cleaning apparatus as recited in claim 2, wherein the imparted acoustic energy is communicated through the fluid that resides in the at least one passage.

4. A substrate cleaning apparatus as recited in claim 2, wherein the fluid is applied to the brush material through a nozzle.

5. A substrate cleaning apparatus as recited in claim 4, wherein a substantially uniform meniscus layer of fluid covers the surface of the substrate.

6. A substrate cleaning apparatus as recited in claim 1, wherein the brush is a flat brush.

7. A substrate cleaning apparatus as recited in claim 6, wherein a shape of the transducer is one of a circular, a quarter-arc length of a circle, and an eight-arc length of a circle.

8. A substrate cleaning apparatus, comprising:

a plurality of transducers capable of resonating at a high frequency; and

a brush material attached to surfaces of the transducers, the brush material including at least one passage extending to the surface of each transducer of the plurality of transducers, the brush material being configured to be applied to a surface of the substrate, wherein each transducer of the plurality of transducers is configured to resonate at the high frequency so as to impart acoustic energy onto the surface of the substrate at a respective location of each at least one passage extending to the surface of each transducer.

9. A substrate cleaning apparatus as recited in claim 8, wherein the brush material is saturated with a fluid.

10. A substrate cleaning apparatus as recited in claim 9, wherein acoustic energy imparted by the plurality of transducers is communicated with the surface of the substrate through the fluid residing in each at least one passage extending to the surface of each transducer of the plurality of transducers.

11. A substrate cleaning apparatus as recited in claim 9, wherein the fluid is applied to the brush material through a nozzle.

12. A substrate cleaning apparatus as recited in claim 11, wherein a substantially uniform meniscus layer of fluid covers the surface of the substrate.

13. A substrate cleaning apparatus as recited in claim 8, wherein the brush is a flat brush.

14. A substrate cleaning apparatus as recited in claim 13, wherein a shape of each transducer is one of a circular, a quarter-arc length of a circle, an eight-arc length of a circle.

15. A substrate cleaning apparatus as recited in claim 8, wherein the brush is a roller brush.

16. A substrate cleaning apparatus as recited in claim 15, wherein a shape of each transducer is one of a circular, a rectangle, and a square.

17. A substrate cleaning apparatus, comprising:

a plurality of transducers capable of resonating at a high frequency, each transducer including a crystal and a resonator, the resonator having a frontside and a backside, the crystal being defined on the backside of the resonator; and

a brush material attached to the frontside of each resonator, the brush material being a porous material, the brush material including at least one passage extending to the frontside of each resonator of the plurality of resonators, the brush material configured to be applied onto a surface of the substrate, wherein each transducer of the plurality of transducers is configured to resonate at the high frequency so as to impart acoustic energy onto the surface of the substrate at a respective location of each at least one passage extending to the frontside of the resonator of each transducer.

18. A substrate cleaning apparatus as recited in claim 17, wherein acoustic energy imparted by the plurality of transducers is communicated with the surface of the substrate through a fluid residing in each at least one passage extending to the frontside of each resonator of each transducer of the plurality of transducers.

19. A substrate cleaning apparatus, comprising:

a transducer capable of resonating at a high frequency, the transducer including a crystal and a resonator, the resonator having a frontside and a backside, the crystal being defined on the backside of the resonator; and

a brush material attached to the frontside of the resonator, the brush material being a porous material, the brush material including at least one passage extending to the frontside of the resonator, the brush material being configured to be applied onto a surface of the substrate, the transducer when resonating at the high frequency being capable of imparting acoustic energy onto the surface of the substrate at a location of the at least one passage.

20. A substrate cleaning apparatus as recited in claim 19, wherein the brush material is saturated with a fluid, and further wherein the imparted acoustic energy is communicated through the fluid that resides in the at least one passage.