Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactor

• US 6,951,765 B1
• Filed: 12/12/2001
• Issued: 10/04/2005
• Est. Priority Date: 12/12/2001
• Status: Expired due to Fees

• Current Assignee: Novellus Systems Incorporated (Lam Research Corporation)
• Original Assignee: Novellus Systems Incorporated (Lam Research Corporation)
• Inventors: Schulberg, Michelle, Joyce, Patrick, Ramanathan, Sasangan, Gopinath, Sanjay, Juarez, Francisco, Van Cleemput, Patrick A.
• Primary Examiner(s): MENZ, LAURA MARY
• Application Number:
  US10/016,017
• Time in Patent Office: 1,392 Days
• Field of Search: 438/689, 438/704, 438/5, 438/14, 134/105, 134/108, 134/109, 134/26, 134/1.3, 134/1.2, 134/56.R, 137/12, 137/557, 138/5, 417/36, 417/38, 210/97, 210/137, 210/143
• US Class Current: 438/5
• CPC Class Codes: C23C 18/1678 Heating of the substrate
• CPC Class Codes: C23C 18/1685 with supercritical condition, e.g. chemical fluid deposition
• CPC Class Codes: C25D 17/02 Tanks; Installations therefor
• CPC Class Codes: C25D 21/18 of electrolytes C25D21/22 takes precedence
• CPC Class Codes: C25D 5/003 Electroplating using gases, e.g. pressure influence

Abstract

The present invention pertains to apparatus and methods for introduction of solid precursors and reactants into a supercritical fluid reactor. Solids are dissolved in supercritical fluid solvents in generator apparatus separate from the supercritical fluid reactor. Such apparatus preferably generate saturated solutions of solid precursors via recirculation of supercritical fluids through a vessel containing the solid precursors. Supercritical solutions of the solids are introduced into the reactor, which itself is charged with a supercritical fluid. Supercritical conditions are maintained during the delivery of the dissolved precursor to the reactor. Recirculation of supercritical precursor solutions through the reactor may or may not be implemented in methods of the invention. Methods of the invention are particularly well suited for integrated circuit fabrication, where films are deposited on wafers under supercritical conditions.

Claims

1. An apparatus for providing a solid precursor to a surface of a work piece via a supercritical solution, the apparatus comprising:

a plurality of vessels for housing the solid precursor and allowing it to contact a solvent under supercritical or near supercritical conditions to generate a saturated solution of the solid precursor, wherein supercritical condition exist when the temperature and pressure of a solution are at or above the solution'"'"'s critical temperature and pressure, and wherein near supercritical conditions exist when the reduced temperature and pressure of a solution are both greater than 80% of their critical point but the solution is not yet in the supercritical phase;

a generator recirculation loop in fluid communication with the plurality of vessels and allowing the saturated solution of the solid precursor to recirculate through the plurality of vessels, said saturated solution being under supercritical or near supercritical conditions over its entire recirculation path; and

a delivery mechanism adapted to deliver, under supercritical or near supercritical conditions, a portion of the saturated solution to a reactor for housing said work piece;

wherein the solid precursor is a solid at or about standard temperature and pressure.

2. The apparatus of claim 1, wherein the delivery mechanism comprises a plurality of syringe pumps.

3. The apparatus of claim 2, further comprising a dilution mechanism for diluting the saturated solution with said solvent under supercritical or near supercritical conditions to produce a diluted solution of the solid precursor for delivery to the reactor.

4. The apparatus of claim 1, wherein the work piece is a partially fabricated integrated circuit.

5. The apparatus of claim 1, wherein the generator recirculation loop comprises a pump for providing fluid flow and a valve for causing at least some fraction of the solvent to circulate through the plurality of vessels housing the solid precursor to ensure production of the saturated solution.

6. The apparatus of claim 3, wherein the dilution mechanism also comprises the plurality of syringe pumps.

7. The apparatus of claim 3, wherein the dilution mechanism comprises a source of supercritical solvent for supplying the plurality of syringe pumps.

8. The apparatus of claim 3, further comprising a reactor recirculation loop configured to allow recirculation of the diluted solution trough the reactor under supercritical or near supercritical conditions.

9. The apparatus of claim 8, further comprising a first fluid inlet, in fluid communication with the reactor, for supplying supercritical fluids to the reactor, and a first bleed valve, located downstream from the reactor.

10. The apparatus of claim 9, further comprising a by-pass line configured to allow isolation of the reactor from the reactor recirculation loop, thus forming a by-pass recirculation loop.

11. The apparatus of claim 10, further comprising a second fluid inlet, in fluid communication with the by-pass recirculation loop, for supplying supercritical fluid directly to the by-pass recirculation loop.

12. The apparatus of claim 11, wherein the second fluid inlet comprises a secondary feed line which feeds from the first fluid inlet.

13. The apparatus of claim, 12 further comprising a second bleed valve, located downstream from the reactor and the first bleed valve.

14. The apparatus of claim 8, wherein the reactor recirculation loop provides flow of the diluted solution through the reactor at between about 50 and 200 ml per minute.

15. The apparatus of claim 1, wherein components of the apparatus comprise at least one of hastalloy, stainless steel, and inconel.