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Photosensitive composition for photoresist manufacture

  • US 6,953,649 B2
  • Filed: 06/01/2001
  • Issued: 10/11/2005
  • Est. Priority Date: 06/05/2000
  • Status: Expired due to Fees
First Claim
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1. A photosensitive composition for photoresists, comprising a copolymer with hydrophobic blocks, at least one block of which is a hydrophobic block capable of generating a hydrophilic block, which comprises, at its end, a group selected from the group consisting of dithioesters, thioethers-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating, under the effect of radiation, an active species which reacts with the hydrophobic block to generate said hydrophilic block.

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