High voltage withstanding semiconductor device
First Claim
1. A semiconductor device comprising:
- an insulating gate type field effect transistor portion having a source region and a drain region separated from each other by a channel formation region, a gate electrode separated from said channel formation region by a gate insulating film; and
a stabilizing plate, made of a conductor or of a semiconductor, which is separated from said drain region by an insulating film, said stabilizing plate, drain region and insulating film therebetween forming a stabilizing plate capacitor;
wherein said stabilizing plate capacitor has a capacitance greater than capacitance formed between said gate electrode and said drain region.
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Abstract
A semiconductor device of the present invention has an insulating gate type field effect transistor portion having an n-type emitter region (3) and an n− silicon substrate (1), which are opposed to each other sandwiching a p-type body region (2), as well as a gate electrode (5a) which is opposed to p-type body region (2) sandwiching a gate insulating film (4a), and also has a stabilizing plate (5b). This stabilizing plate (5b) is made of a conductor or a semiconductor, is opposed to n− silicon substrate (1) sandwiching an insulating film (4, 4b) for a plate, and forms together with n− silicon substrate (1), a capacitor. This stabilizing plate capacitor formed between stabilizing plate (5b) and n− silicon substrate (1) has a capacitance greater than that of the gate-drain capacitor formed between gate electrode (5a) and n− silicon substrate (1).
36 Citations
14 Claims
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1. A semiconductor device comprising:
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an insulating gate type field effect transistor portion having a source region and a drain region separated from each other by a channel formation region, a gate electrode separated from said channel formation region by a gate insulating film; and
a stabilizing plate, made of a conductor or of a semiconductor, which is separated from said drain region by an insulating film, said stabilizing plate, drain region and insulating film therebetween forming a stabilizing plate capacitor;
whereinsaid stabilizing plate capacitor has a capacitance greater than capacitance formed between said gate electrode and said drain region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A semiconductor device comprising:
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an insulating gate type field effect transistor portion having a source region and a drain region separated from each other by a channel formation region, a gate electrode separated from said channel formation region by a gate insulating film;
a stabilizing plate, which is separated from said drain region by an insulating film, said stabilizing plate, drain region and insulating film therebetween forming a stabilizing plate capacitor; and
an impurity diffusion region surrounding a cell formation region having arranged therein a plurality of cells including said transistor portion, said impurity diffusion region being deeper than said channel formation region and opposite in conductivity to said source region and said drain region;
wherein said stabilizing plate is provided in said impurity diffusion region. - View Dependent Claims (14)
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Specification