Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography

• US 6,954,275 B2
• Filed: 08/01/2001
• Issued: 10/11/2005
• Est. Priority Date: 08/01/2000
• Status: Expired due to Fees

• Current Assignee: Board of Regents of the University of Texas System (University of Texas System)
• Original Assignee: Board of Regents of the University of Texas System (University of Texas System)
• Inventors: Colburn, Matthew, Willson, C. Grant, Choi, Byung J., Bailey, Todd, Ekerdt, John, Sreenivasan, S. V.
• Primary Examiner(s): Pham, Hoa Q.
• Assistant Examiner(s): Nguyen, Sang H.
• Application Number:
  US09/920,341
• Publication Number:
  US 20020093122A1
• Time in Patent Office: 1,532 Days
• Field of Search: 356601-625, 356392-395, 356398-401, 250/548, 250/557, 250/491.1, 738/568, 430/5, 430/302, 430/309
• US Class Current: 356/614
• CPC Class Codes: B29C 2035/0827 using UV radiation
• CPC Class Codes: B29C 2037/90 Measuring, controlling or regulating
• CPC Class Codes: B29C 2043/025 forming a microstructure, i.e. fine patterning
• CPC Class Codes: B29C 31/045 moving along predetermined circuits or distributing the material according to predetermined patterns
• CPC Class Codes: B29C 31/047 combined with moving moulds B29C31/044, B29C31/048 take precedence
• CPC Class Codes: B29C 35/0888 using transparant moulds
• CPC Class Codes: B29C 37/005 Compensating volume or shape change during moulding, in general
• CPC Class Codes: B29C 43/003 characterised by the choice of material
• CPC Class Codes: B29C 43/021 characterised by the shape of the surface
• CPC Class Codes: B29C 59/022 characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
• CPC Class Codes: B29D 11/0023 Transferring contact lenses
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 9/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00

Abstract

Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.

Claims

1. A method of determining a spacing between a template and a substrate spaced-apart from the template, defining a region therebetween having an index of refraction associated therewith, the method comprising:

impinging incident light upon the region by propagating the incident light along a path having a plurality of indices of refraction associated therewith, including the index of refraction, to form monitoring light; and

determining from the monitoring light, a measured dimension of the region by ascertaining a wavenumber associated with the monitoring light that is a function of a wavelength of the monitoring light and the index of refraction.

2. The method of claim 1, further comprising determining an error signal, wherein the error signal corresponds to a difference between a desired dimension of the region and a measured dimension of the region.

3. The method of claim 1, further comprising determining an error signal, wherein the error signal corresponds to a difference between a desired dimension of the region and a measured dimension of the region;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the spacing between the template and the substrate in response to the difference.

4. The method of claim 1, further comprising making plurality of dimensional measurements of the region at differing locations and determining whether the template and the substrate are substantially parallel based on the plurality of dimensional measurements.

5. The method of claim 4, further comprising determining parallelism between the template and the substrate in response to the plurality of dimensional measurements.

6. The method of claim 4, further comprising dynamically adjusting an orientation between the template and the substrate to maintain parallelism therebetween.

7. The method of claim 1, further comprising making a plurality of dimensional measurements of the region at 3 or more non-colinear locations and determining whether the template and the substrate are substantially parallel based on the plurality of dimensional measurements.

8. The method of claim 7, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration.

9. The method of claim 7, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the relative position of the template and the substrate to achieve a substantially parallel configuration.

10. The method of claim 1, wherein determining further comprises monitoring variations in an intensity of the monitored light across various wavelengths.

11. The method as recited in claim 1, wherein the incident light comprises a plurality of wavelengths.

12. The method as recited in claim 11, wherein determining further includes obtaining data representative of an intensity of at least some of the wavelengths associated with the monitoring light.

13. The method as recited in claim 1, wherein the monitoring light comprises reflected light.

14. The method as recited in claim 1, wherein the region comprises a material, with the material having said index of refraction.

15. The method as recited in claim 1, wherein the region comprises a material, with the material substantially filling the region.

16. The method as recited in claim 1, wherein determining further includes ascertaining the dimension of the region be a function of an intensity of the monitoring light.

17. The method as recited in claim 1, wherein the template is a patterned template.

18. The method as recited in claim 1, wherein the template is a substantially planar template.

19. The method as recited in claim 1, wherein the optical characteristics include an intensity of the monitoring light.

20. A method of determining a spacing between a template and a substrate, the method comprising:

positioning the template in a spaced relationship with respect to the substrate defining a gap therebetween, with a material being disposed in the gap and having an index of refraction associated therewith;

applying incident light to the template and the substrate;

monitoring light reaching an interface of the template with the material, defining monitored light; and

determining a magnitude of the spacing between the template and the substrate based on the monitored light by obtaining data representative of optical properties of the monitored light, with the magnitude being a function of optical characteristics of the material and a wavelength of the monitored light.

21. The method of claim 20, further comprising determining an error signal, wherein the error signal corresponds to a difference between a desired distance between the template and the substrate and the spacing between the template and the substrate.

22. The method of claim 20, further comprising determining an error signal, wherein the error signal corresponds to a difference between a desired distance between the template and the substrate and the spacing between the template and the substrate;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the spacing between the template and the substrate.

23. The method of claim 20, further comprising determining the spacing between the template and the substrate at a plurality of locations and determining whether the template and the substrate are substantially parallel based on the plurality of spacing determinations.

24. The method of claim 23, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration.

25. The method of claim 23, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the relative position of the template and the substrate to achieve a substantially parallel configuration.

26. The method of claim 20, further comprising determining the spacing between the template and the substrate at 3 or more non-colinear locations and determining whether the template and the substrate are substantially parallel based on the 3 or more spacing determinations.

27. The method of claim 26, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration.

28. The method of claim 26, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate into a substantially parallel configuration;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the relative position of the template and the substrate to achieve a substantially parallel configuration.

29. The method of claim 20, wherein monitoring light reflected from the template and the substrate further comprises monitoring variations in intensity of the monitored light across various wavelengths.

30. The method as recited in claim 20, wherein the incident light comprises a plurality of wavelengths.

31. The method as recited in claim 30, wherein determining the magnitude further includes obtaining data representative of an intensity of at least some of the wavelengths associated with the monitored light.

32. The method as recited in claim 20, wherein the monitored light comprises reflected light.

33. The method as recited in claim 20, wherein the index of refraction and the wavelength of the monitored light define a wavenumber, with the magnitude further being a function of the optical properties of the monitored light corresponding to the wavenumber.

34. The method as recited in claim 20, wherein the optical characteristics of the material include the index of refraction.

35. The method as recited in claim 20, wherein the material substantially fills the gap.

36. The method as recited in claim 20, wherein the template is a patterned template.

37. The method as recited in claim 20, wherein the template is a substantially planar template.

38. The method as recited in claim 20, wherein the optical properties of the monitored light include an intensity of the monitored light.

39. A method of determining a spacing between a template and a substrate, with a material being disposed between the template and the substrate, the method comprising:

positioning the template in a spaced relationship with respect to the substrate defining a gap therebetween, with said material being disposed in said gap and having an index of refraction associated therewith;

applying light to the template and the substrate, wherein the light comprises a plurality of wavelengths;

monitoring light reflected from a surface of the template and the substrate defining monitored light; and

determining a magnitude of the spacing between the template and the substrate based on the monitored light by obtaining data representative of an intensity of at least some of the wavelengths associated with the monitored light arid determining a wavenumber associated therewith, wherein the wavenumber is a function of the index of refraction and the wavelength of the monitored light, with said magnitude being a function of the wavenumber.

40. The method of claim 39, further comprising determining an error signal, wherein the error signal corresponds to the difference between a desired distance between the template and the substrate and the magnitude.

41. The method of claim 39, further comprising determining an error signal, wherein the error signal corresponds to the difference between a desired distance between the template and the substrate and the magnitude;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the spacing between the surface of the template and the substrate.

42. The method of claim 39, wherein the template comprises a plurality of recesses defined on a surface thereof.

43. The method of claim 39, wherein the template comprises a plurality of recesses defined on a surface thereof, wherein the recesses are of a known depth.

44. The method of claim 39, wherein the template comprises a plurality of recesses defined on a surface thereof and wherein applying light to the template and the substrate comprises passing the light through one or more of the recesses.

45. The method of claim 39, wherein the template comprises a plurality of recesses defined on a surface thereof and wherein a depth of each recess is at least ¼

of a mean wavelength of the light applied to the template and the substrate.

46. The method of claim 39, further comprising determining the distance between the template and the substrate at a plurality of locations and determining whether the template and the substrate are substantially parallel based on the plurality of distance determinations.

47. The method of claim 46, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate in to a substantially parallel configuration.

48. The method of claim 46, further comprising determining an error signal, wherein the error signal corresponds to a relative movement between the template and the substrate required to bring the template and the substrate in to a substantially parallel configuration;

and sending the error signal to at least one actuator, wherein the at least one actuator is configured to adjust the relative position between the template and the substrate to achieve a substantially parallel configuration.

49. The method of claim 39, wherein the template is a patterned template.