Structure and method for latchup suppression utilizing trench and masked sub-collector implantation
First Claim
1. An integrated circuit comprising:
- a substrate of a first polarity;
a trench structure in said substrate;
a well region of a second polarity abutting said trench structure;
a heavily doped region of said second polarity abutting said trench structure; and
a shallow trench isolation region, wherein said trench structure comprises a deep trench structure having a depth and a width, wherein said depth is at least twice as large as said width, and wherein said shallow trench isolation region is over said deep trench structure,wherein said heavily doped region having a dopant concentration greater than a dopant concentration of said well region, and wherein said heavily doped region is adapted to suppress latch-up in said integrated circuit.
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Abstract
A method and structure for an integrated circuit comprising a substrate of a first polarity; a trench structure in the substrate; a well region of a second polarity abutting the trench structure; and a heavily doped region of the second polarity abutting the trench structure, wherein the heavily doped region is adapted to suppress latch-up in the integrated circuit, wherein the heavily doped region comprises a sub-collector region, and wherein the trench structure comprises a deep trench structure or a trench isolation structure. The integrated circuit further comprises a p+ anode in the well region and a n+ cathode in the well region, wherein the integrated circuit is configured as a latchup robust p-n diode. In another embodiment, the integrated circuit further comprises a p+ anode in the well region; a n+ cathode in the well region; and a gate structure over the p+ anode and n+ cathode.
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Citations
11 Claims
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1. An integrated circuit comprising:
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a substrate of a first polarity; a trench structure in said substrate; a well region of a second polarity abutting said trench structure; a heavily doped region of said second polarity abutting said trench structure; and a shallow trench isolation region, wherein said trench structure comprises a deep trench structure having a depth and a width, wherein said depth is at least twice as large as said width, and wherein said shallow trench isolation region is over said deep trench structure, wherein said heavily doped region having a dopant concentration greater than a dopant concentration of said well region, and wherein said heavily doped region is adapted to suppress latch-up in said integrated circuit. - View Dependent Claims (2, 3, 4, 5, 6, 8, 9, 10, 11)
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7. A complementary metal oxide semiconductor (CMOS) device, said CMOS device comprising:
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a p-type substrate; shallow trench isolation (STI) regions in said p-type substrate; p-type diffusion regions in said p-type substrate and in between successive ones of said STI regions; a n-type retrograde well in said p-type substrate; a deep trench isolation region bounding said p-type diffusion regions and said n-type retrograde well; and a n-type sub-collector adjacent to a sidewall of said deep trench isolation region and below said STI regions, wherein said p-type diffusion regions, said n-type retrograde well, and said p-type substrate form pnp parasitic bipolar transistor in said CMOS device, and wherein said deep trench isolation region and said n-type sub-collector are adapted to suppress latch-tip in said CMOS device that is caused by said pnp parasitic bipolar transistor.
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Specification