Low capacitance ESD protection device, and integrated circuit including the same
First Claim
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1. A low capacitance ESD protection device comprising:
- a substrate;
a well of a first conductivity type in the substrate;
a first and second transistor of the first conductivity type respectively on two sides of the well;
a guard ring of a second conductivity type in the substrate, surrounding the well, and the first and second transistor; and
a doped region of the second conductivity type in the well;
a conducting layer on the doped region, having a first, second and third portion separated from each other by gaps extend in a predetermined direction;
wherein, for each of the first and second transistor, a width of a drain region is substantially equal to that of a source region, and a length of the drain region is shorter than that of the source region.
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Abstract
A low capacitance ESD protection device. The device comprises a substrate, a well of a first conductivity type in the substrate, a first and second transistor of the first conductivity type respectively on two sides of the well, a guard ring of a second conductivity type in the substrate, surrounding the well, and the first and second transistor, and a doped region of the second conductivity type in the well, wherein profiles of a drain and source region of each of the first and second transistor are un-symmetrical, and an area of the drain region is smaller than that of the source region in each of the first and second transistor.
39 Citations
25 Claims
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1. A low capacitance ESD protection device comprising:
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a substrate; a well of a first conductivity type in the substrate; a first and second transistor of the first conductivity type respectively on two sides of the well; a guard ring of a second conductivity type in the substrate, surrounding the well, and the first and second transistor; and a doped region of the second conductivity type in the well; a conducting layer on the doped region, having a first, second and third portion separated from each other by gaps extend in a predetermined direction; wherein, for each of the first and second transistor, a width of a drain region is substantially equal to that of a source region, and a length of the drain region is shorter than that of the source region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An integrated circuit comprising:
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a core circuit; and a low capacitance ESD protection device protecting the core circuit form ESD damages, comprising; a substrate; a well of a first conductivity type in the substrate; a first and second transistor of the first conductivity type respectively on two sides of the well; a guard ring of a second conductivity type in the substrate, surrounding the well, and the first and second transistor; and a doped region of the second conductivity type in the well; a conducting layer on the doped region, having a first, second and third portion separated from each other by gaps extend in a predetermined direction; wherein profiles of a drain and source region of each of the first and second transistor are un-symmetrical, and an area of the drain region is smaller than that of the source region in each of the first and second transistor. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification