Electrode configuration for piano MEMs micromirror

• US 6,968,101 B2
• Filed: 05/21/2004
• Issued: 11/22/2005
• Est. Priority Date: 05/28/2002
• Status: Active Grant

• Current Assignee: Lumentum Operations, LLC (Lumentum Holdings Inc.)
• Original Assignee: Viavi Solutions, Inc. (Lumentum Holdings Inc.)
• Inventors: Miller, John Michael, Jin, Wenlin, Keyworth, Barrie, Ma, Yuan, Hess, David R.
• Primary Examiner(s): Bovernick, Rodney
• Assistant Examiner(s): ROJAS, OMAR R
• Application Number:
  US10/850,407
• Publication Number:
  US 20040258350A1
• Time in Patent Office: 550 Days
• Field of Search: 359223-226, 359/290, 359/292, 359/295, 359/298, 385/16, 385/18
• US Class Current: 385/18
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81B 3/0062 Devices moving in two or more dimensions, i.e. having special features which allow movement in more than one dimension
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: G02B 6/3518 the reflective optical element being an intrinsic part of a MEMS device, i.e. fabricated together with the MEMS device MEMS devices in general B81B; manufacture of MEM devices in general B81C; micromechanical devices controlling the direction of light G02B26/0833
• CPC Class Codes: G02B 6/3544 2D constellations, i.e. with switching elements and switched beams located in a plane
• CPC Class Codes: G02B 6/356 in an optical cross-connect device, e.g. routing and switching aspects of interconnecting different paths propagating different wavelengths to (re)configure the various input and output links switching polarized beams G02B6/3594; power equalizers G02B6/356 and G02B6/3594; path selecting means H04Q11/0001
• CPC Class Codes: G02B 6/357 Electrostatic force electrostatic forces controlling reflecting elements in general G02B26/0841
• CPC Class Codes: G02B 6/3584 constructional details of an associated actuator having a MEMS construction, i.e. constructed using semiconductor technology such as etching MEMS per se B81B, B81C
• CPC Class Codes: Y10S 359/904 Micromirror

Abstract

A micro-electro-mechanical (MEMs) mirror device for use in an optical switch is disclosed. A “piano”-style MEMs device includes an elongated platform pivotally mounted proximate the middle thereof by a torsional hinge. The middle portion of the platform and the torsional hinge have a combined width less than the width of the rest of the platform, whereby several of these “piano” MEMs devices can be positioned adjacent each other pivotally mounted about the same axis with only a relatively small air gap therebetween. In a preferred embodiment of the present invention specially designed for wavelength switching applications, a greater range of arcuate motion for a mirror mounted thereon is provided by enabling the platform to rotate about two perpendicular axes. The MEMs mirror device according to the preferred embodiment of the present invention enables the mirror to tilt about two perpendicular axes, by the use of an “internal” gimbal ring construction, which ensures that a plurality of adjacent mirror devices have a high fill factor, without having to rely on complicated and costly manufacturing processes.

Claims

1. A micro-electro-mechanical device mounted on a substrate comprising:

a pivoting member pivotally mounted on said substrate about first and second axes, said pivoting member including a first and a second supporting region on opposite sides of said first axis;

a first hinge extending from said substrate rotatable about the first axis;

a gimbal ring connected to outer ends of said first hinge;

a second hinge extending from said gimbal ring to said pivoting member rotatable about the second axis;

a first electrode beneath the first supporting region for pivoting the pivoting member about the first axis;

a second electrode beneath the second supporting region for pivoting the pivoting member about the first axis;

a third electrode beneath a portion of said pivoting member along the first axis, adjacent said second hinge; and

wherein said gimbal ring is disposed between said first and second supporting regions.

2. The device according to claim 1, further comprising electrode control means for gradually decreasing a voltage to said first electrode to a minimum, while increasing a voltage to said third electrode to a maximum, and then gradually increasing a voltage to said second electrode, while decreasing the voltage to said third electrode to a minimum, thereby indirectly rotating the pivoting member about the first axis.

3. The device according to claim 1, wherein a longitudinal axis of said first and second electrodes is offset from a longitudinal axis of said pivoting member on an opposite side of said third electrode to ensure any mask misalignment of said pivoting member and said first and second electrodes can be compensated by said third electrode.

4. The device according to claim 1, wherein said third electrode extends from adjacent said first electrode to adjacent said second electrode passed a gap therebetween.

5. The device according to claim 1, wherein the pivoting member includes an offset section extending from a side thereof, beneath which said third electrode is disposed.

6. The device according to claim 1, wherein said first and second hinges are positioned between said first and second supporting regions, whereby outer edges of said pivoting member are free of said hinges enabling adjacent pivoting members to be positioned in close proximity.

7. The device according to claim 6, wherein the first electrode includes arms extending on either side of said second hinge;

and wherein the third electrode includes arms extending on either side of said first hinge.

8. The device according to claim 6, wherein the pivoting member includes an offset section extending from a side thereof adjacent the first and second hinges, beneath which said third electrode is positioned.

9. The device according to claim 1, further comprising shields disposed on each side of said first electrode for limiting the amount of electrical cross-talk between adjacent pivoting members.

10. The device according to claim 9, wherein the shields extend downwardly from an undersurface of said pivoting member.

11. The device according to claim 9, wherein the shields extend upwardly from the substrate above a top surface of the first electrode.

12. The device according to claim 9, wherein the shields extend upwardly from the substrate above a top surface of the first electrode, and downwardly from an undersurface of said pivoting member inside or outside of the upwardly extending shields.

13. The device according to claim 1, wherein said first electrode includes:

a hot electrode;

a trace electrically connecting said hot electrode to a power source;

a ground plane covering said trace, thereby reducing the amount of force applied to an outer free end of said pivoting member.

14. The device according to claim 13, wherein the ground plane extends around the hot electrode at a level different than the hot electrode defining a substantially vertical surface therebetween, wherein the substantially vertical surface comprises a dielectric surface for isolating the hot electrode from the ground plane.

15. The device according to claim 13, wherein the ground plane extends around the hot electrode at a level higher than the hot electrode defining a substantially vertical surface therebetween, wherein the substantially vertical surface comprises a dielectric surface for isolating the hot electrode from the ground plane.