×

Method and apparatus for inspecting distorted patterns

  • US 6,973,207 B1
  • Filed: 11/30/1999
  • Issued: 12/06/2005
  • Est. Priority Date: 11/30/1999
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for training a system to inspect a spatially distorted pattern, the method comprising:

  • receiving a digitized image of an object, the digitized image including a region of interest;

    dividing the region of interest in its entirety into a plurality of non-overlapping sub-regions, a size of each of the non-overlapping sub-regions being small enough such that an image-feature-position-based inspecting tool can reliably inspect each of the sub-regions;

    training only a fine search tool and an image-feature-position-based inspection tool for a respective single model for each of the plurality of non-overlapping sub-regions;

    building a single search tree for determining an order for inspecting each non-overlapping sub-region of the plurality of non-overlapping sub-regions at a run-time; and

    training a coarse alignment tool for the region of interest in its entirety so as to enable providing at run time an approximate location for a root sub-region of the single search tree.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×