Integrated chemical microreactor, thermally insulated from detection electrodes, and manufacturing and operating methods therefor

• US 6,974,693 B2
• Filed: 06/23/2004
• Issued: 12/13/2005
• Est. Priority Date: 09/27/2000
• Status: Expired due to Term

• Current Assignee: STMicroelectronics SRL (STMicroelectronics NV)
• Original Assignee: STMicroelectronics SRL (STMicroelectronics NV)
• Inventors: Villa, Flavio, Barlocchi, Gabriele
• Primary Examiner(s): REDDING, DAVID A
• Application Number:
  US10/874,902
• Publication Number:
  US 20040235149A1
• Time in Patent Office: 538 Days
• Field of Search: 435/287.1, 435/288.5, 435/293.1, 435/305.1, 435/287.2, 422/68.1, 422/102, 204/403.01
• US Class Current: 435/288.5
• CPC Class Codes: B01L 2200/12 Specific details about manufacturing devices
• CPC Class Codes: B01L 2300/0645 Electrodes
• CPC Class Codes: B01L 2300/0825 Test strips
• CPC Class Codes: B01L 2300/1827 using resistive heater
• CPC Class Codes: B01L 2300/1883 using thermal insulation
• CPC Class Codes: B01L 3/502707 characterised by the manufacture of the container or its components by shaping or joining plastic parts B29C59/00, B29C65/00; by laminating B32B37/00; manufacture of microstructural devices in general B81C
• CPC Class Codes: B01L 7/52 with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples amplification or hybridisation processes per se C12Q1/68; controlling sequential reactions for synthesis B01J19/0046

Abstract

Integrated microreactor, formed in a monolithic body and including a semiconductor material region and an insulating layer; a buried channel extending in the semiconductor material region; a first and a second access trench extending in the semiconductor material region and in the insulating layer, and in communication with the buried channel; a first and a second reservoir formed on top of the insulating layer and in communication with the first and the second access trench; a suspended diaphragm formed by the insulating layer, laterally to the buried channel; and a detection electrode, supported by the suspended diaphragm, above the insulating layer, and inside the second reservoir.

Claims

1. A method, comprising applying a biological fluid and a reagent to an integrated microreactor comprising:

a) a monolithic semiconductor body;

b) a buried channel, extending inside said monolithic semiconductor body;

c) a first and a second access cavity in communication with said buried channel;

d) a reservoir having a suspended diaphragm formed from said monolithic semiconductor body, laterally to, but not over, said buried channel and in fluid communication with said buried channel; and

e) a detection electrode, supported by said suspended diaphragm,

i) wherein a biological reaction occurs in said buried channel and said biological reaction is detected at said detection electrode.

2. The method of claim 1, wherein said biological fluid contains nucleic acid and said biological reaction is amplification.

3. The method of claim 1, wherein said biological fluid contains DNA and said biological reaction is polymerase chain reaction.

4. A method, comprising:

a) introducing a fluid into a buried channel via a first access trench, the buried channel extending inside a monolithic semiconductor material body at a distance from a surface of the semiconductor material body;

b) heating the fluid within the buried channel and optionally cooling the fluid within the buried channel;

c) extracting the fluid from the buried channel via a second access trench into a reservoir comprising a suspended diaphragm that is lateral to, but not over said buried channel; and

having a sensing electrode structure on said diaphragm; and

d) detecting a desired product within the fluid by the use of said sensing electrode.

5. The method of claim 4, wherein the heating step is performed by:

passing an electric current through a heating element arranged in the semiconductor material body on top of the buried channel.

6. The method of claim 5, wherein the reservoirs are formed in a resist layer formed on the surface of the semiconductor material body.

7. The method according to claim 6, further including repeating the heating and cooling steps a plurality of times to achieve a desired reaction in the fluid.

8. The method according to claim 7, wherein the cooling step is carried out by terminating the heating of the fluid and permitting the fluid to cool towards the ambient.

9. The method according to claim 8, wherein the cooling step is carried out by terminating the heating of the fluid and drawing heat from the fluid using a heat transfer mechanism.

10. The method of claim 9, wherein the suspended diaphragm is formed by an insulation layer formed on the semiconductor material body, and wherein the sensing electrode structure is formed on the insulation layer.

11. An integrated microreactor, comprising:

a) a monolithic body, having a semiconductor material region;

b) a buried channel, extending inside said semiconductor material region;

c) a first and a second access cavity, extending in said monolithic body, and in communication with said buried channel;

d) a suspended diaphragm formed from said monolithic body, laterally to, but not over, said buried channel; and

e) a detection electrode, supported by said suspended diaphragm.

12. A microreactor according to claim 11, wherein said monolithic body comprises an insulating region, superimposed to said semiconductor material region, and forming said suspended diaphragm.