Method and device for vacuum treatment
First Claim
1. A vacuum-processing method of carrying out, in a vacuum processing vessel, a process wherein an effect of the process changes as the number of processed objects increases, and controlling a controlled parameter affecting the effect of the process directly so that the controlled parameter is maintained at a target value, said vacuum-processing method comprising the steps of:
- determining a mode of variation of the effect of the process through measurement;
determining a mode of the controlled parameter change to keep the effect of the process constant;
determining a model function on the basis of the determined mode of variation of the effect of the process and the determined mode of the controlled parameter change; and
calculating the target value of the controlled parameter every time one or a plurality of objects are processed, on the basis of the model function and a set value of a set parameter representing the effect of the process.
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Accused Products
Abstract
A vacuum-processing method carries out, in a vacuum-processing vessel (4), a process wherein a condition of an interior of the vacuum processing vessel (4) changes as the number of processed objects (W) increases, such as a film-forming process for forming a thin film on a semiconductor wafer (W) by using a process gas in the vacuum processing vessel (4). The vacuum-processing method controls a controlled parameter directly affecting an effect of the process, such as film thickness, so that the controlled parameter is maintained at a target value (rt). The vacuum-processing method determines a model function obeying a change of the condition of the interior of the processing vessel (4), and calculates the target value (rt) of the controlled parameter every time one or a plurality of objects (W) are processed on the basis of a set value (Dt) of a set parameter representing the effect of the process, and the model function.
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Citations
10 Claims
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1. A vacuum-processing method of carrying out, in a vacuum processing vessel, a process wherein an effect of the process changes as the number of processed objects increases, and controlling a controlled parameter affecting the effect of the process directly so that the controlled parameter is maintained at a target value, said vacuum-processing method comprising the steps of:
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determining a mode of variation of the effect of the process through measurement; determining a mode of the controlled parameter change to keep the effect of the process constant; determining a model function on the basis of the determined mode of variation of the effect of the process and the determined mode of the controlled parameter change; and calculating the target value of the controlled parameter every time one or a plurality of objects are processed, on the basis of the model function and a set value of a set parameter representing the effect of the process. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A vacuum-processing apparatus comprising a vacuum processing vessel for containing an object to carry out a process wherein an effect of the process changes as the number of processed objects increases in the processing vessel, said vacuum-processing apparatus further comprising:
a controller for controlling a controlled parameter affecting the effect of the process directly so that the controlled parameter is maintained at a target value; and
a processing condition compensator storing a model function determined on the basis of a mode of variation of the effect of the process and a mode of change of the controlled parameter, and calculating the target value of the controlled parameter on the basis of the model function and a set value of a set parameter representing the effect of the process.- View Dependent Claims (9, 10)
Specification