Methods for fabricating fuses for use in semiconductor devices and semiconductor devices including such fuses

• US 6,979,601 B2
• Filed: 04/21/2003
• Issued: 12/27/2005
• Est. Priority Date: 04/16/1999
• Status: Expired due to Fees

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Violette, Michael P., Marr, Kenneth W.
• Primary Examiner(s): Kennedy, Jennifer M.
• Application Number:
  US10/420,176
• Publication Number:
  US 20030211661A1
• Time in Patent Office: 981 Days
• Field of Search: 438/132, 438/601, 257/529, 257/209
• US Class Current: 438/132
• CPC Class Codes: H01L 23/5256 comprising fuses, i.e. connections having their state changed from conductive to non-conductive
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A metal silicide fuse for a semiconductor device. The fuse includes a conductive region positioned adjacent a common well of a first conductivity type, a terminal region positioned adjacent a well of a second conductivity type, and a narrowed region located between the terminal region and the conductive region and positioned adjacent a boundary between the two wells. Upon applying at least a programming current to the fuse, the fuse “blows” at the narrowed region. The diode or diodes between wells of different conductivity types wells and the Schottky diode or diodes between the remaining portions of the fuse and wells adjacent thereto control the flow of current through the remainder of the fuse and through the associated wells of the semiconductor device. When the fuse has been “blown,” the diodes and Schottky diodes prevent current of a normal operating voltage from flowing through the wells of the semiconductor device.

Claims

1. A method for fabricating a fuse of a semiconductor device, comprising:

imparting first regions of a semiconductor substrate with a first conductivity type;

imparting second regions of the semiconductor substrate with a second conductivity type, each second region of the second regions being located adjacent to or at least partially surrounded by a corresponding first region of the first regions following imparting first regions and imparting second regions;

forming a layer comprising metal silicide over the first regions and the second regions; and

forming the fuse from the layer, including at least two terminal regions that are each positioned adjacent to a corresponding one of the first and second regions and a narrowed region between the at least two terminal regions and located over a boundary between the first and second regions.

2. The method of claim 1, wherein imparting first regions with the first conductivity type comprises imparting the first regions with an n-type conductivity.

3. The method of claim 1, wherein imparting second regions comprises imparting the second regions with a p-type conductivity.

4. The method of claim 1, wherein forming the layer comprises depositing the metal silicide.

5. The method of claim 4, wherein depositing comprises chemical vapor depositing the metal suicide.

6. The method of claim 1, wherein forming the layer comprises forming a layer comprising metal adjacent an active surface of the semiconductor substrate and annealing the metal to silicon or polysilicon adjacent the layer comprising metal.

7. The method of claim 6, further comprising forming another layer comprising silicon or polysilicon adjacent the layer comprising metal.

8. The method of claim 7, wherein annealing comprises annealing the metal to at least the silicon or polysilicon of the another layer.

9. The method of claim 1, wherein forming the fuse comprises forming a mask over the layer comprising metal suicide and removing selected regions of the layer comprising metal silicide through the mask.

10. The method of claim 9, wherein removing comprises etching the selected regions of the layer comprising metal silicide.

11. The method of claim 6, wherein forming the fuse comprises forming a mask over the layer comprising metal and removing selected regions of the layer through the mask prior to annealing.

12. The method of claim 11, wherein removing comprises etching the selected regions through the mask.

13. The method of claim 1, further comprising:

forming a contact in communication with each of the at least two terminal regions of the fuse.

14. The method of claim 1, wherein imparting second regions comprises imparting at least two spaced-apart second regions of the semiconductor substrate with the second conductivity type, each of the at least two spaced-apart second regions being located adjacent to or at least partially surrounded by the corresponding first region.

15. A method for fabricating a fuse of a semiconductor device, comprising:

forming at least one first well of a first conductivity type in a semiconductor substrate, adjacent to a surface thereof;

forming at least one second well of a second conductivity type within or laterally adjacent to the at least one first well and adjacent to the surface; and

forming at least one fusible element including a fusible region over the surface, the fusible region overlapping a boundary between the at least one first well and the at least one second well and contacting the surface at least at the boundary.

16. The method of claim 15, wherein forming at least one first well comprises imparting at least a first region of the semiconductor substrate with the first conductivity type.

17. The method of claim 16, wherein forming at least one first well comprises doping at least the first region to have the first conductivity type.

18. The method of claim 15, wherein forming at least one first well comprises forming the at least one first well to have an n-type conductivity.

19. The method of claim 15, wherein forming at least one second well comprises imparting at least one second region of the semiconductor substrate with the second conductivity type.

20. The method of claim 19, wherein forming at least one second well comprises doping the at least one second region to have the second conductivity type.

21. The method of claim 15, wherein forming at least one second well comprises forming the at least one second well to have a p-type conductivity.

22. The method of claim 15, wherein forming at least one fusible element comprises:

forming a layer comprising metal silicide adjacent the surface.

23. The method of claim 22, wherein forming at least one fusible element further comprises:

patterning the layer comprising metal silicide to form the fusible region.

24. The method of claim 22, wherein forming the layer comprises depositing metal silicide onto at least a portion of the surface.

25. The method of claim 24, wherein depositing comprises chemical vapor depositing the metal silicide.

26. The method of claim 22, wherein forming the layer comprises:

forming a layer comprising metal over at least a portion of the surface; and

annealing the metal to adjacent silicon, polysilicon, metal suicide, or polycide.

27. The method of claim 26, further comprising:

forming another layer comprising semiconductive material adjacent to the layer comprising metal.

28. The method of claim 27, wherein forming the another layer comprises forming the another layer between the surface and the layer comprising metal.

29. The method of claim 27, wherein forming the another layer comprises forming the another layer on the layer comprising metal.

30. The method of claim 27, wherein annealing comprises annealing the metal to the semiconductive material of the another layer.

31. The method of claim 26, wherein annealing comprises annealing the metal to semiconductive material of the semiconductor substrate.

32. The method of claim 15, further comprising:

forming a contact in communication with a terminal of the at least one fusible element and the at least one second well.

33. The method of claim 32, further comprising:

forming another contact to communicate with another terminal of the at least one fusible element and the at least one first well.

34. The method of claim 15, wherein forming the at least one second well comprises forming at least two second wells, each second well of the at least two second wells being located adjacent to or at least partially surrounded by the at least one first well.