Photoelectron emission microscope for wafer and reticle inspection
First Claim
Patent Images
1. A method of imaging a substrate, comprising:
- a) exposing said substrate to an influx of relatively high-energy electrons, said high-energy electrons having an energy selected to cause secondary electrons to leave said substrate,b) exposing said substrate to an influx of relatively low-energy electrons, said electrons having both an energy and a current density profile selected to maintain surface charge present on said substrate at a predetermined level,c) filtering said secondary electrons and the portion of said relatively low-energy electrons which are reflected from the surface of said substrate, after proper selection of the angle of incidence for the electron beams, in order to select most or all of said secondary electrons which are emitted at angles other than perpendicular to the substrate and most or all of said reflected electrons which are scattered away from the specular angle, and to reject most or all of said secondary electrons which are emitted at an angle perpendicular to the substrate and most or all of said reflected electrons which are scattered at the specular angle,d) focusing said selected secondary electrons and said selected reflected electrons to create an image of said substrate in the plane of a detector,e) detecting said selected secondary electrons and said selected reflected electrons, thereby imaging a portion of said substrate.
0 Assignments
0 Petitions
Accused Products
Abstract
A method of inspecting and imaging substrates with an electron beam. The method can include a illuminating the substrate with a photon beam to cause photoemission of electrons. A low energy electron beam can be used to prevent or reduce positive charging of the substrate. Reflected electrons and/or emitted photoelectrons can be imaged to review or inspect the substrate.
22 Citations
1 Claim
-
1. A method of imaging a substrate, comprising:
-
a) exposing said substrate to an influx of relatively high-energy electrons, said high-energy electrons having an energy selected to cause secondary electrons to leave said substrate, b) exposing said substrate to an influx of relatively low-energy electrons, said electrons having both an energy and a current density profile selected to maintain surface charge present on said substrate at a predetermined level, c) filtering said secondary electrons and the portion of said relatively low-energy electrons which are reflected from the surface of said substrate, after proper selection of the angle of incidence for the electron beams, in order to select most or all of said secondary electrons which are emitted at angles other than perpendicular to the substrate and most or all of said reflected electrons which are scattered away from the specular angle, and to reject most or all of said secondary electrons which are emitted at an angle perpendicular to the substrate and most or all of said reflected electrons which are scattered at the specular angle, d) focusing said selected secondary electrons and said selected reflected electrons to create an image of said substrate in the plane of a detector, e) detecting said selected secondary electrons and said selected reflected electrons, thereby imaging a portion of said substrate.
-
Specification
-
- Resources
Litigation Campaign Assessment
Thank you for your request. You will receive a custom alert email when the Litigation Campaign Assessment is available.
×
-
Current AssigneeKla-Tencor Technologies Corporation (KLA Corporation)
-
Original AssigneeKla-Tencor Technologies Corporation (KLA Corporation)
-
InventorsMarcus, Matthew, Adler, David
-
Primary Examiner(s)Lee, John R.
-
Assistant Examiner(s)Johnston, Phillip A
-
Application NumberUS10/017,262Publication NumberTime in Patent Office1,474 DaysField of Search250/307, 250/365US Class Current250/307CPC Class CodesG01N 23/227 Measuring photoelectric eff...H01J 2237/2817 Pattern inspectionH01J 37/285 Emission microscopes, e.g. ...
