Exposure system for creating a patterned polarization compensator

• US 6,982,773 B2
• Filed: 02/01/2005
• Issued: 01/03/2006
• Est. Priority Date: 01/07/2002
• Status: Expired due to Term

• Current Assignee: Sony Corporation (Sony Group Corp.)
• Original Assignee: Moxtek Inc (Nippon Kayaku Company Limited)
• Inventors: Kurtz, Andrew F., Silverstein, Barry D., Mi, Xiang-Dong
• Primary Examiner(s): CHOWDHURY, TARIFUR RASHID
• Application Number:
  US11/048,557
• Publication Number:
  US 20050128392A1
• Time in Patent Office: 336 Days
• Field of Search: 349/5, 349/9, 349/96, 349/113, 349117-121, 353/20, 359/486
• US Class Current: 349/117
• CPC Class Codes: G02B 27/18 for optical projection, e.g. combination of mirror and condenser and objective photographic, cine and overhead projectors G03B21/00; photographic projection printing G03B27/32; photolithographic projectors G03F7/20; projection television H04N5/74; colour projection television H04N9/31
• CPC Class Codes: G02B 27/283 used for beam splitting or combining
• CPC Class Codes: G02B 5/3016 involving passive liquid crystal elements optical properties of liquid crystals G02F1/0063; polarising elements associated with active liquid crystal devices G02F1/133528
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles
• CPC Class Codes: G02F 1/133536 Reflective polarizers G02F1/13362 takes precedence
• CPC Class Codes: G02F 1/133548 Wire-grid polarisers
• CPC Class Codes: G02F 1/133634 the refractive index Nz perpendicular to the element surface being different from in-plane refractive indices Nx and Ny, e.g. biaxial or with normal optical axis
• CPC Class Codes: G02F 1/133638 Waveplates, i.e. plates with a retardation value of lambda/n
• CPC Class Codes: G02F 2203/02 reflective
• CPC Class Codes: H04N 9/3108 by using a single electronic spatial light modulator
• CPC Class Codes: H04N 9/3167 for polarizing the light beam polarizing optical systems per se G02B27/28
• CPC Class Codes: H04N 9/3191 Testing thereof testing of displays in general G09G3/006

Abstract

A modulation optical system (40) provides modulation of an incident light beam. A wire grid polarization beamsplitter (240) receives the beam of light (130) and transmits a beam of light having a first polarization, and reflects a beam of light having a second polarization orthogonal to the first polarization. Sub-wavelength wires (250) on the wire grid polarization beamsplitter face a reflective spatial light modulator. The reflective spatial light modulator receives the polarized beam of light and selectively modulates the polarized beam of light to encode data thereon. The reflective spatial light modulator reflects back both the modulated light and the unmodulated light to the wire grid polarization beamsplitter. The wire grid polarization beamsplitter separates the modulated light from the unmodulated light. A compensator (260) is located between the wire grid polarization beamsplitter and the reflective spatial light modulator (210). The compensator conditions the polarization states of the oblique and skew rays of the modulated beam and includes a spatially variant retardance that corrects for a spatially variant retardance of the reflective spatial light modulator.

Claims

1. An exposure system for creating a patterned polarization compensator comprising:

(a) a light source for providing an incident beam of light;

(b) polarization optics including at a polarization beamsplitter, for transmitting light of said beam of light having a first polarization, and for reflecting light of said beam of light having a second polarization orthogonal to said first polarization;

(c) a polarization based reflective spatial light modulator having an undesired spatial retardance variation;

wherein said modulator receives said polarized beam of light, having either a first polarization or a second polarization, and selectively modulates said polarized beam of light to encode data thereon, providing both modulated light and unmodulated light which differ in polarization;

(d) wherein said reflective spatial light modulator reflects back both said modulated light and said unmodulated light to said polarization beamsplitter;

(e) an imaging lens which uses said modulated light to create an image of said reflective spatial light modulator onto a light-sensitive material; and

(f) wherein said light-sensitive material is exposed and patterned with variations that correlate with said undesired spatial retardance variation of said polarization based reflective spatial light modulator, thereby facilitating the fabrication of a patterned polarization compensator.

2. An exposure system according to claim 1 wherein said polarization beamsplitter is a wire grid polarizer.

3. An exposure system as in claim 1 wherein said imaging lens nominally operates at unity magnification.

4. An exposure system according to claim 1 wherein said reflective spatial light modulator is a liquid crystal device.

5. An exposure system as in claim 1 wherein said spatially variant retardance patterned into said compensator was created with said reflective spatial light modulator operating at a mid-level between the on and off states of said modulator.

6. An exposure system according to claim 1 wherein said incident beam of light is visible light.

7. An exposure system according to claim 6 wherein said light-sensitive material includes visible wavelength sensitive polymer photo-initiators.

8. An exposure system for creating a patterned polarization compensator comprising:

(a) a light source for providing an incident beam of light;

(b) polarization optics including a first polarizer for providing a polarized beam of light;

(c) a polarization based spatial light modulator having an undesired spatial retardance variation;

wherein said modulator receives said polarized beam of light, and selectively modulates said polarized beam of light to encode data thereon, providing both modulated light and unmodulated light which differ in polarization;

(d) wherein said unmodulated light is removed from said modulated light by a second polarizer; and

(e) a light-sensitive material that is exposed and patterned with variations that correlate with said undesired spatial retardance variation of said polarization based spatial light modulator, thereby facilitating the fabrication of a patterned polarization compensator.

9. An exposure system according to claim 8 wherein said spatial light modulator is a liquid crystal device.

10. An exposure system according to claim 8 wherein said incident beam of light is visible light.

11. An exposure system according to claim 10 wherein said light-sensitive material includes visible wavelength sensitive polymer photo-initiators.

12. An exposure system according to claim 8 wherein an imaging lens is used to image said spatial light modulator onto said light sensitive material.

13. An exposure system as in claim 8 wherein said spatially variant retardance patterned into said compensator was created with said spatial light modulator operating at a mid-level between the on and off states of said modulator.

14. A method for fabricating a spatially patterned polarization compensator comprising:

(a) providing a light sensitive material;

(b) providing an incident beam of light and a polarizer to polarize said incident beam of light;

(c) directing said incident polarized beam of light to a polarization based spatial light modulator;

wherein said modulator has undesired spatial retardance variations;

(d) directing said polarized beam of light emerging from said polarization based spatial light modulator first to a polarizer and then secondly to a target plane;

(e) providing a light sensitive material at said target plane, wherein said light sensitive material is exposed by said polarized beam of light, so as to pattern said light sensitive material with variations that correlate with said undesired spatial retardance variations;

(f) coating said light sensitive material with a liquid crystal polymer material, thereby creating spatial retardance variations that correlate with said undesired spatial retardance variations; and

(g) fixing said light sensitive material by exposure with ultra-violet light.