Optical waveguides and grating structures fabricated using polymeric dielectric compositions

• US 6,985,663 B2
• Filed: 10/06/2004
• Issued: 01/10/2006
• Est. Priority Date: 07/26/2001
• Status: Expired due to Fees

• Current Assignee: Penn State Research Foundation
• Original Assignee: Penn State Research Foundation
• Inventors: Catchmark, Jeffrey M., Lavallee, Guy P.
• Primary Examiner(s): Palmer, Phan T. H.
• Application Number:
  US10/960,314
• Publication Number:
  US 20050117843A1
• Time in Patent Office: 461 Days
• Field of Search: 385/8, 385/10, 385/14, 385/24, 385/37, 385/129, 385/131, 385/122, 430/321, 556/453, 372/102
• US Class Current: 385/129
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 2006/12097 Ridge, rib or the like
• CPC Class Codes: G02B 6/12004 Combinations of two or more optical elements
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/124 Geodesic lenses or integrated gratings
• CPC Class Codes: G02B 6/4214 the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device G02B6/4246 takes precedence
• CPC Class Codes: G02B 6/4249 comprising arrays of active devices and fibres
• CPC Class Codes: G02F 1/0147 based on thermo-optic effects G02F1/132 takes precedence
• CPC Class Codes: G02F 1/065 in an optical waveguide structure
• CPC Class Codes: G02F 2201/30 grating

Abstract

Using polymeric dielectric materials (preferably materials derived from bisbenzocyclobutene monomers) and an electron beam lithography process for patterning this material, we have developed a process for fabricating optical waveguides with complex integrated devices such as gratings. Such gratings are not limited to one-dimensional type gratings but can include 2 dimensional gratings such as curved gratings or photonic crystals. Due to the properties of BCB, this process could also be implemented using optical photolithography depending upon the waveguide dimensions desired and the grating dimensions desired. Alternatively, the optical waveguide could be patterned using optical lithography and the grating can be patterned using electron beam lithography. In addition, the general process described below can be applied to the fabrication of complex lightwave circuits containing, for example, multiple optical waveguides, couplers/splitters, grating based filters and even more complex devices and structures.

Claims

1. An optical device comprising:

at least one BCB waveguide structure;

at least one BCB grating structure disposed on said at least one BCB waveguide structure;

cladding material on which said at least one waveguide structure is disposed; and

optionally

a substrate on which said cladding material is disposed, wherein at least one feature of said grating or waveguide is nano-scale.

2. The device of claim 1, wherein said substrate is low temperature co-fired ceramic.

3. The device of claim 2, wherein BCB is disposed on said low temperature co-fired ceramic.

4. The device of claim 2, further comprising at least one optical fiber.

5. The device of claim 1, wherein said cladding material has an index of refraction less than said at least one BCB waveguide structure.

6. The device of claim 1, wherein said cladding material is selected from the group consisting of:

spin on glass and silicon dioxide.

7. The device of claim 1, wherein said substrate is selected from the group consisting of:

semiconductors glasses, plastics, polymers, metals, ceramics, insulators, organic materials, inorganic materials, and any combinations thereof.

8. The device of claim 1, wherein at least one feature of said waveguide is from 5 nanometers to 50 nanometers in size.

9. The device of claim 1, wherein at least one feature of said grating structure is from 5 nanometers to 50 nanometers in size.

10. The device of claim 1, wherein said device has a plurality of waveguide structures.

11. The device of claim 1, wherein said device has a plurality of grating structures.

12. The device of claim 1, further comprising at least one resistive element.

13. The device of claim 1, further comprising at least one metal contact.

14. The device of claim 1, wherein said cladding material is applied to said substrate by plasma enhanced chemical vapor deposition.

15. A tunable optical device having at least one integrated waveguide and grating structure comprising:

a substrate material containing one or more electrically contacted heat producing elements;

a cladding material disposed on said substrate;

at least one waveguide structure disposed on said cladding material;

at least one grating structure disposed on or near said waveguide structure;

wherein said waveguide structure and/or said grating structure are in close proximity to said thermal element.

16. The device of claim 15, wherein said grating is composed of bisbenzocyclobutane (BCB).

17. The device of claim 15, wherein said cladding material is applied to said substrate by plasma enhanced chemical vapor deposition.

18. A tunable optical device having at least one integrated waveguide and grating structure comprising:

a substrate material containing one or more electrically contacted heat producing elements;

a planarizing material disposed on top of said heat producing elements;

a cladding material disposed on said planarizing material;

at least one waveguide structure disposed on said cladding material;

at least one grating structure disposed on or near said waveguide structure;

wherein said waveguide structure and/or said grating structure are in close proximity to said thermal element.

19. The device of claim 18, wherein said planarizing material is bisbenzocyclobutene (BCB).

20. The device of claim 18, wherein said grating is composed of bisbenzocyclobutene (BCB).