Enhanced sample processing devices, systems and methods

• US 6,987,253 B2
• Filed: 05/06/2004
• Issued: 01/17/2006
• Est. Priority Date: 06/28/2000
• Status: Expired due to Term

• Current Assignee: DiaSorin S.p.A.
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Bedingham, William, Robole, Barry W., Seshadri, Kannan, Rajagopal, Raj
• Primary Examiner(s): ROBINSON, DANIEL LEON
• Application Number:
  US10/840,766
• Publication Number:
  US 20050242091A1
• Time in Patent Office: 621 Days
• Field of Search: 219/752, 219/388, 219/700, 219/702, 422/72, 422/58, 422/64, 422/68, 422/50
• US Class Current: 219/752
• CPC Class Codes: B01L 2200/027 for microfluidic devices
• CPC Class Codes: B01L 2300/0681 Filter
• CPC Class Codes: B01L 2300/0806 Standardised forms, e.g. compact disc [CD] format
• CPC Class Codes: B01L 2300/0864 comprising only one inlet and multiple receiving wells, e.g. for separation, splitting
• CPC Class Codes: B01L 2300/087 Multiple sequential chambers
• CPC Class Codes: B01L 2300/0874 Three dimensional network
• CPC Class Codes: B01L 2300/0887 Laminated structure
• CPC Class Codes: B01L 2300/1822 using Peltier elements
• CPC Class Codes: B01L 2300/1861 using radiation
• CPC Class Codes: B01L 2400/0409 centrifugal forces
• CPC Class Codes: B01L 2400/0661 shape memory polymer valves
• CPC Class Codes: B01L 2400/0677 phase change valves; Meltable, freezing, dissolvable plugs; Destructible barriers
• CPC Class Codes: B01L 3/5025 for parallel transport of multiple samples
• CPC Class Codes: B01L 3/5027 by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip B01L3/5023 takes precedence; micromixers B01F33/30; microreactors for synthesis B01J19/0093; microcapillary devices in general B81B1/00
• CPC Class Codes: B01L 3/50273 characterised by the means or forces applied to move the fluids micropumps F04B19/006, of the membrane type F04B43/043
• CPC Class Codes: B01L 3/502738 characterised by integrated valves microvalves F16K99/0001
• CPC Class Codes: B01L 7/52 with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples amplification or hybridisation processes per se C12Q1/68; controlling sequential reactions for synthesis B01J19/0046
• CPC Class Codes: B03C 1/30 Combinations with other devices, not otherwise provided for
• CPC Class Codes: F27B 9/16 the charge moving in a circular or arcuate path
• CPC Class Codes: F27D 5/00 Supports, screens, or the like for the charge within the furnace travelling or movable supports F27D3/12
• CPC Class Codes: G01N 35/00069 : whereby the sample substrate is of the bio-disk type, i.e. having the format of an optical disk
• CPC Class Codes: G01N 35/0098 : involving analyte bound to insoluble magnetic carrier, e.g. using magnetic separation magnetic particles used in immunoassays G01N33/54326; magnetic separation in general B03C
• CPC Class Codes: H05B 6/80 : Apparatus for specific applications stoves or ranges F24C7/02
• CPC Class Codes: Y10T 436/2575 : Volumetric liquid transfer

Abstract

Devices, systems, and methods for processing sample materials. The sample materials may be located in a plurality of process chambers in the device, which is rotated during heating of the sample materials.

Claims

1. A method of processing sample material comprising:

providing a device comprising a plurality of process chamber arrays, each of the process chamber arrays comprising a loading chamber and a process chamber;

providing sample material in the loading chamber of at least one of the process chamber arrays;

moving the sample material from the loading chamber to the process chamber by rotating the device;

providing paramagnetic particles within the sample material located in the process chamber;

providing a magnet proximate the device;

rotating the device such that the paramagnetic particles within the sample material are subjected to the magnetic field of the magnet during the rotating;

locating a first major surface of the device in contact with a top surface of a base plate that comprises the top surface, a bottom surface, and a thermal structure, wherein at least some process chambers of the plurality of process chamber arrays are in thermal communication with the thermal structure when the first major surface of the device is in contact with the top surface of the base plate; and

controlling the temperature of the thermal structure by directing electromagnetic energy at the bottom surface of the base plate while rotating the base plate and the device, whereby the temperature of the sample material in the process chambers is controlled.

2. The method of claim 1, wherein the thermal structure comprises at least one substantially continuous circular ring in the base plate.

3. The method of claim 1, wherein the thermal structure comprises a plurality of independent thermal structures.

4. The method of claim 1, further comprising directing electromagnetic energy into the process chambers of the plurality of process chamber arrays while directing electromagnetic energy at the bottom surface of the base plate.

5. The method of claim 1, further comprising directing electromagnetic energy into the process chambers of the plurality of process chamber arrays while directing electromagnetic energy at the bottom surface of the base plate, and wherein the device further comprises electromagnetic energy receptive materials proximate the process chambers of the plurality of process chamber arrays, wherein the electromagnetic energy receptive materials convert the electromagnetic energy directed into the process chambers of the plurality of process chamber arrays into thermal energy.

6. The method of claim 1, wherein the device further comprises baffle structures on a second major surface of the device.

7. The method of claim 1, wherein the device further comprises directional baffle structures on a second major surface of the device, and further wherein the directional baffle structures increase the rate of thermal energy transfer out of the process chambers of the plurality of process chamber arrays when rotating the device in one direction relative to the rate of thermal energy transfer out of the process chambers of the plurality of process chamber arrays when rotating the device in an opposite direction.

8. The method of claim 1, wherein the device further comprises a control pattern, the control pattern comprising at least one indicator associated with each of the process chambers, the method further comprising:

detecting the control pattern while rotating the base plate and the devices; and

controlling the electromagnetic energy directed at the bottom surface of the base plate based on detecting the control pattern.

9. The method of claim 1, wherein the top surface of the base plate comprises a plurality of raised protrusions extending above the top surface surrounding each raised protrusion of the plurality of protrusions, wherein each raised protrusion is aligned with one process chamber of the plurality of process chamber arrays.

10. The method of claim 1, further comprising monitoring the temperature of the sample material while rotating the device.

11. The method of claim 1, further comprising monitoring the temperature of the thermal structure while rotating the device.

12. The method of claim 1, wherein controlling the temperature of the thermal structure comprises sequentially increasing and decreasing the temperature of the thermal structure through at least two cycles of increasing and decreasing temperature.