Reaction mass for a stage device
First Claim
1. A stage assembly for manufacturing semiconductor wafers, comprising:
- a stage to position at least one substrate, the stage being moved by a force generator in response to a wafer manufacturing control system;
a base having an upper side supporting the stage, the base being allowed to move in response to a reaction force generated by the force generator;
at least one bearing having a plurality of pressurized air layers to support the base allowing the base to move relative to a stationary surface; and
at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and the reaction force, the at least one actuator comprising an actuator disposed adjacent to a side outer surface of the base to generate a correction torque about an axis perpendicular to the upper side of the base.
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Accused Products
Abstract
A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface. The base, acting as a massive reaction mass, stores a kinetic energy from the reaction force and gradually dissipates such energy by applying small forces to the reaction mass. The stage assembly and support system according to this invention are also capable of canceling any disturbance forces acting on the base.
16 Citations
51 Claims
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1. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved by a force generator in response to a wafer manufacturing control system; a base having an upper side supporting the stage, the base being allowed to move in response to a reaction force generated by the force generator; at least one bearing having a plurality of pressurized air layers to support the base allowing the base to move relative to a stationary surface; and at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and the reaction force, the at least one actuator comprising an actuator disposed adjacent to a side outer surface of the base to generate a correction torque about an axis perpendicular to the upper side of the base. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved in accordance with a wafer manufacturing control system; a base having an upper side supporting the stage, the base being allowed to move in response to a reaction force generated by a movement of the stage; at least one bearing having a plurality of pressurized air layers to allow the base to levitate above a stationary surface; and at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and the reaction force, the at least one actuator comprising an actuator disposed adjacent to a side outer surface of the base to generate a correction torque about an axis perpendicular to the upper side of the base. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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39. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved by a force generator in response to a wafer manufacturing control system; a base supporting the stage, the base being allowed to move in response to a reaction force generated by the force generator; a plurality of pneumatic bearings to support the base allowing the base to move relative to a stationary surface, the plurality of pneumatic bearings comprising a first layer of pressurized air to allow the base to move linearly along a first axis and a second axis, and to rotate around a third axis, the first, second, and third axes being orthogonal to each other, and a second layer of pressurized air to allow a top flat surface of each of the plurality of pneumatic bearings to conform to an undersurface of the base; and at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and the reaction force.
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40. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved in accordance with a wafer manufacturing control system; a base supporting the stage, the base being allowed to move in response to a reaction force generated by a movement of the stage; a plurality of pneumatic bearings to allow the base to levitate above a stationary surface, the plurality of pneumatic bearings comprising a first layer of pressurized air to allow the base to move linearly along a first axis and a second axis, and to rotate around a third axis, the first, second, and third axes being orthogonal to each other, and a second layer of pressurized air to allow a top flat surface of each of the plurality of pneumatic bearings to conform to an undersurface of the base; and at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and a reaction force.
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41. A stage assembly comprising:
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a stage that retains a substrate; a force generator connected to the stage, the force generator moving the stage; a movable member that is allowed to move in response to a reaction force generated by at least one of a movement of the stage and the force generator; and at least one support system that supports the movable member, the at least one support system having a plurality of supporting parts to allow the movable member to move relative to a stationary surface, wherein each of the plurality of supporting parts includes at least two air layers. - View Dependent Claims (42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
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Specification