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Method of making an integrated inductor

  • US 6,988,307 B2
  • Filed: 08/29/2002
  • Issued: 01/24/2006
  • Est. Priority Date: 11/23/1999
  • Status: Expired due to Term
First Claim
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1. A method comprising:

  • forming a first dielectric layer over a substrate comprising a semiconductor material;

    forming a magnetic layer over the first dielectric layer;

    forming a second dielectric layer over the magnetic layer;

    forming a conductor over the second dielectric layer; and

    patterning the first dielectric layer and the magnetic layer to define one or more trenches such that the conductor defines a signal path along the one or more trenches.

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