Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device

• US 6,989,647 B1
• Filed: 11/26/1999
• Issued: 01/24/2006
• Est. Priority Date: 04/01/1994
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Lee, Martin E.
• Primary Examiner(s): Ro, Bentsu
• Application Number:
  US09/449,762
• Time in Patent Office: 2,251 Days
• Field of Search: 318/649, 318/687, 33/1.M, 744/71.XY, 744/900.7, 744/900.8, 414/749.1, 414/749.2, 355/53, 355/72, 355/75
• US Class Current: 318/649
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment
• CPC Class Codes: H01L 21/682 Mask-wafer alignment in general G03F7/70, G03F9/70

Abstract

A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide cooperating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage cooperating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

Claims

1. A positioning device with an object table and a drive unit by which the object table is displaceable over a guide parallel to at least an X-direction, which guide is fastened to a first frame of the positioning device while a stationary part of the drive unit is fastened to a second frame of the positioning device which is dynamically isolated from the first frame, wherein a reaction force exerted by the object table on the drive unit during operation and arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

2. A positioning device as claimed in claim 1, wherein the object table is coupled to the stationary part of the drive unit exclusively by a Lorentz force of a magnet system and an electric coil system of the drive unit during operation.

3. A positioning device with an object table and a drive unit by which the object table is displaceable over a guide parallel to at least an X-direction, which guide is fastened to a first frame of the positioning device while a stationary part of the drive unit is fastened to a second frame of the positioning device which is dynamically isolated from the first frame, wherein a reaction force exerted by the object table on the drive unit during operation and arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame, wherein the object table is coupled to the stationary part of the drive unit exclusively by a Lorentz force of a magnet system and an electric coil system of the drive unit during operation, and wherein the magnet system and the electric coil system belong to a first linear motor of the drive unit, which drive unit comprises a second linear motor with a stationary part fastened to the second frame and a movable part which is displaceable parallel to the X-direction over a guide of the stationary part, the magnet system of the first linear motor being fastened to the object table and the electric coil system of the first linear motor being fastened to the movable part of the second linear motor.

4. A lithographic device with a machine frame which, seen parallel to a vertical Z-direction, supports in that order a radiation source, a mask holder, a focusing system with a main axis directed parallel to the Z-direction, and a substrate holder which is displaceable perpendicularly to the Z-direction by means of a positioning device, the positioning device of the substrate holder including an object table and a drive unit by which the object table is displaceable over a guide parallel to at least an X-direction, which guide is fastened to a first frame of the positioning device while a stationary part of the drive unit is fastened to a second frame of the positioning device which is dynamically isolated from the first frame, wherein the first frame of the positioning device of the substrate holder belongs to the machine frame of the lithographic device, while the second frame of the positioning device of the substrate holder belongs to a force frame of the lithographic device which is dynamically isolated from the machine frame;

and wherein a reaction force exerted by the object table on the drive unit during operation and arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

5. A lithographic device as claimed in claim 4, wherein the mask holder is displaceable perpendicularly to the Z-direction by means of a mask holder positioning device that is similar to the positioning device of the substrate holder, and wherein a first frame of the mask holder positioning device belongs to the machine frame of the lithographic device, while a second frame of the mask holder positioning device belongs to the force frame of the lithographic device.

6. A lithographic device with a machine frame which, seen parallel to a vertical Z-direction, supports in that order a radiation source, a mask holder which is displaceable perpendicularly to the Z-direction by means of a positioning device, a focusing system with a main axis directed parallel to the Z-direction, and a substrate holder which is displaceable perpendicularly to the Z-direction by means of a further positioning device, the positioning device of the mask holder including an object table and a drive unit by which the object table is displaceable over a guide parallel to at least an X-direction, which guide is fastened to a first frame of the positioning device while a stationary part of the drive unit is fastened to a second frame of the positioning device which is dynamically isolated from the first frame, wherein the first frame of the positioning device of the mask holder belongs to the machine frame of the lithographic device, while the second frame of the positioning device of the mask holder belongs to a force frame of the lithographic device which is dynamically isolated from the machine frame;

and wherein a reaction force exerted by the object table on the drive unit during operation and arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.