Lithographic apparatus and device manufacturing method

• US 6,989,886 B2
• Filed: 06/08/2004
• Issued: 01/24/2006
• Est. Priority Date: 06/08/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Jager, Pieter Willem Herman
• Primary Examiner(s): MATHEWS, ALAN A
• Application Number:
  US10/862,881
• Publication Number:
  US 20050270512A1
• Time in Patent Office: 595 Days
• Field of Search: 355/53, 355/67, 355/71, 355/77, 430/5, 430/322, 359/558, 359/563, 359/564
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

A lithographic apparatus comprises an illumination system that supplies a projection beam of radiation, which is patterned using a patterning system. A projection system projects the patterned beam along a predetermined beam path onto a target portion of a substrate. The projection system comprises an array of lenses located such that each lens directs a respective portion of the patterned beam towards a respective part of the target portion of the substrate. The projection system also comprises a series of lens components spaced apart along the beam path between the patterning system and the array of lenses. The lens components are dimensioned to collect at least third order diffraction components of the patterned beam.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a projection beam of radiation;

a patterning system that patterns the projection beam; and

a projection system that projects the patterned beam along a predetermined beam path onto a target portion of a substrate, the projection system comprising,

an array of lenses located such that each lens in the array of lenses directs a respective portion of the patterned beam towards a respective part of the target portion of the substrate, and

a series of lens components spaced apart along the beam path between the patterning system and the array of lenses,

wherein the series of lens components are dimensioned to collect at least third order diffraction components of the patterned beam.

2. The apparatus of claim 1, wherein the lens components are dimensioned to additionally collect at least fifth order components of the patterned beam.

3. The apparatus of claim 1, wherein the lens components are dimensioned to additionally collect at least twenty-ninth order components of the patterned beam.

4. The apparatus of claim 1, wherein the patterning system comprises an array of individually controllable elements.

5. A device manufacturing method, comprising:

patterning a projection beam of radiation;

projecting the patterned beam along a predetermined beam path onto a target portion of a substrate using an array of lenses in a projection system, such that each lens in the array of lenses directs a respective portion of the patterned beam towards a respective part of the target portion of the substrate; and

collecting at least third order diffraction components of the patterned beam using lens components of the projection system.

6. The method of claim 5, further comprising spacing apart the lens components along the beam path between the patterning system and the array of lenses.

7. The method of claim 5, further comprising dimensioning the lens components to additionally collect at least fifth order components of the patterned beam.

8. The method of claim 5, further comprising dimensioning the lens components to additionally collect at least twenty-ninth order components of the patterned beam.

9. The method of claim 5, further comprising using an array of individually controllable elements as the patterning system.