System and method for dose control in a lithographic system
First Claim
Patent Images
1. An illumination system comprising:
- a light source; and
an adjusting system including an optical attenuator that adjusts light output from the light source to produce a desired light output signal, wherein the adjusting system is one of a passive adjusting system and an active adjusting system.
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Abstract
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).
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Citations
40 Claims
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1. An illumination system comprising:
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a light source; and
an adjusting system including an optical attenuator that adjusts light output from the light source to produce a desired light output signal, wherein the adjusting system is one of a passive adjusting system and an active adjusting system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. An illumination system, comprising:
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a light source; and
a non-linear optical attenuator that attenuates light from the light source, wherein the illumination system is arranged to be coupled to a maskless lithography device. - View Dependent Claims (18)
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19. An illumination system, comprising:
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a first light source that produces a first light beam having a first energy value;
a second light source that produces a second light beam having a second energy value;
an adjusting system that adjusts the second light beam based on the first energy value; and
a combining device that combines the adjusted second light beam and the first light beam. - View Dependent Claims (20, 21)
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22. An illumination system, comprising:
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a light source that generates a light beam;
a beam splitter that splits the light beam into first and second light beams;
an adjustment system that adjusts the first light beam based on an energy value of the second light beam; and
a combining device that combines the adjusted first light beam and the second light beam. - View Dependent Claims (23)
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24. A maskless lithography system having an illumination system, the illumination system comprising:
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a light source; and
an adjusting system that adjusts light output from the light source to produce a desired light output signal. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
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Specification