Apparatus for manually and automatically processing microelectronic workpieces

• US 6,991,710 B2
• Filed: 02/22/2002
• Issued: 01/31/2006
• Est. Priority Date: 02/22/2002
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Semitool Incorporated (Applied Materials Incorporated)
• Inventors: Woodruff, Daniel J., Harris, Randy
• Primary Examiner(s): King, Roy
• Assistant Examiner(s): Leader, William T.
• Application Number:
  US10/080,914
• Publication Number:
  US 20030159277A1
• Time in Patent Office: 1,439 Days
• Field of Search: 204/198
• US Class Current: 204/198
• CPC Class Codes: C25D 17/001 Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
• CPC Class Codes: C25D 7/123 Semiconductors first coated with a seed layer or a conductive layer
• CPC Class Codes: H01L 21/67766 Mechanical parts of transfer devices robots in general in B25J
• CPC Class Codes: Y10S 134/902 Semiconductor wafer
• CPC Class Codes: Y10S 414/135 Associated with semiconductor wafer handling
• CPC Class Codes: Y10T 29/49124 On flat or curved insulated base, e.g., printed circuit, etc.

Abstract

A method and apparatus for manually and automatically processing microelectronic workpieces. The apparatus can include a tool having a plurality of processing stations, all of which are manually accessible to a user, and an input/output station configured to support at least one microelectronic workpiece for automatic transfer to and from the processing stations. A transfer device is positioned proximate to the input/output station and the processing stations and is configured to automatically transfer microelectronic workpieces between the input/output station and the processing stations. The apparatus can be used for both manual and automatic processing of microelectronic workpieces, either sequentially or simultaneously.

Claims

1. An apparatus for processing microelectronic workpieces, comprising;

a plurality of processing stations;

an enclosure disposed proximate to at least one of the processing stations, the enclosure having an access aperture positioned to allow manual access to all the processing stations from a single side of the apparatus during operation;

an input/output station configured to support at least one microelectronic workpiece for automatic transfer to and from the processing stations; and

a transfer device positioned proximate to the input/output station and the processing stations, the transfer device being automatically movable to transfer microelectronic workpieces between the input/output station and the processing stations;

wherein at least one of the processing stations includes;

a processing vessel configured to provide a processing fluid; and

a support movably positioned proximate to the processing vessel and configured to carry the microelectronic workpiece, the support being moveable between a process position, a first transferring position spaced apart from the process position and a second transferring position spaced apart from the process position and the first transferring position, wherein the support is oriented to carry the microelectronic workpiece in contact with a processing fluid when the processing fluid is in the vessel and the support is in the process position, the support being oriented to receive the microelectronic workpiece from the transfer device when the support is in the first transferring position, and the support being positioned to receive the microelectronic workpiece manually from the user when the support is in the second transferring position, the support being configured to selectively stop its motion at the first and second transferring positions.

2. The apparatus of claim 1, further comprising a shield positioned at least proximate to the transfer device to at least restrict access by the user to the transfer device.

3. The apparatus of claim 1 wherein the transfer device is configured to carry and independently move two microelectronic workpieces.

4. The apparatus of claim 1 wherein the input/output station is configured to support a container carrying a plurality of microelectronic workpieces, with the container being accessible to the transfer device when the container is supported at the input/output station.

5. The apparatus of claim 1 wherein the processing stations are aligned along a generally straight first line and wherein the transfer device includes a robot configured to move along a second line generally parallel to the first line.

6. The apparatus of claim 1 further comprising a shelf carried by the enclosure and positioned to support a container a microelectronic workpieces while the user manually removes the microelectronic workpieces from the container and transfers the microelectronic workpieces to at least one of the processing stations.

7. The apparatus of claim 1 wherein the processing stations are arranged along a generally straight first line and wherein the transfer device includes a robot configured to move along a second line generally parallel to the first line, the second line being positioned between the first line and the access aperture.

8. The apparatus of claim 1 wherein the transfer device includes:

a transfer device support having a guide path;

a base carried by the transfer device support and movable along the guide path;

a lift carried by the base and movable upwardly and downwardly along a lift axis;

an arm carried by the lift, the arm being rotatable relative to the base, the arm having an extension portion projecting away from the lift axis; and

first and second end effectors carried by the arm and rotatably coupled to the extension portion of the arm, with each end effector being independently rotatable relative to the arm and each end effector being configured to releasably carry a microelectronic workpiece.

9. The apparatus of claim 1 wherein the support includes a carrier extending upwardly from the at least one processing station, an elevator supported by the carrier and movable toward and away from the at least one processing station, and a head carried by the elevator, the head having a receiving portion configured to releasably receive the microelectronic workpiece, the head being rotatable relative to the carrier and the at least one processing station.

10. The apparatus of claim 1 wherein the support is inaccessible to the automatic transfer device when the support is in the second transferring position.

11. The apparatus of claim 1 wherein the support is a first distance from the at least one processing station when in the first transferring position, the support being a second distance from the at least one processing station when in the second transferring position, the second distance being greater than the first distance.

12. The apparatus of claim 1 wherein the support includes a carrier extending upwardly from the processing vessel, an elevator supported by the carrier and movable toward and away from the at least one processing station, and a head carried by the elevator, the head having a receiving portion configured to releasably receive the microelectronic workpiece.

13. The apparatus of claim 1 wherein the support includes a carrier extending upwardly from the at least one processing station, the carrier having an elevator supported by the carrier and movable toward and away from the at least one processing station, and a head carried by the elevator, the head having a receiving portion configured to releasably receive the microelectronic workpiece, and wherein the carrier is carried by a guide device positioned above the at least one processing station, the guide device having a guide path, the carrier being movable toward and away from the at least one processing station along the guide path.

14. The apparatus of claim 1, further comprising a track positioned above the at least one processing station, wherein the support is at least partially suspended from the track and is movable along the track toward and away from the at least one processing station.

15. The apparatus of claim 1, further comprising:

a track positioned above the at least one processing station, wherein the support is at least partially suspended from the track and is movable along the track toward and away from the at least one processing station; and

a releasable locking mechanism engagable with the support to at least restrict motion of the support along the track.