Polysilicon and silicon dioxide light scatterers for silicon waveguides on five layer substrates
First Claim
1. A light scattering element for an optical waveguide with a core,where the core of the optical waveguide is comprised of:
- a slab of monocrystalline silicon,a first layer of dielectric material disposed on the slab of monocrystalline silicon, anda strip of monocrystalline silicon disposed on the first layer of dielectric material,where the strip and a silicon body of a transistor are formed from the same monocrystalline silicon on the same substrate, andthe light scattering element is comprised of;
a second layer of dielectric material disposed on the strip of monocrystalline silicon,where the second layer of dielectric material and a gate oxide for a transistor are formed at the same time of the same dielectric material,a layer of polysilicon disposed on the second layer of dielectric material,where the layer of polysilicon and a polysilicon gate for a transistor are formed at the same time from the same polysilicon, anda cladding comprised of a plurality of dielectric materials,where the cladding is disposed over;
the core of the waveguide,the second layer of dielectric materials andthe layer of polysilicon, andat least one of the plurality of dielectric materials is comprised of a layer of salicide block used during the fabrication of a transistor.
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Accused Products
Abstract
A standard CMOS process is used to fabricate optical, optoelectronic and electronic devices at the same time on a monolithic integrated circuit. FIG. 6 shows a polysilicon and silicon dioxide light scattering element formed on a silicon waveguide. The polysilicon light scatterer is formed on the core of the waveguide with a silicon dioxide layer between the polysilicon and the core. A standard CMOS process is used to form the waveguide and the light scattering element. FIG. 6A is a table summarizing the elements of the light scatterer and the waveguide of FIG. 6 and the CMOS transistors of FIGS. 1 and 2, which are formed from the same materials at the same time on the same substrate. Forming multiple light scatterers on the core of a waveguide can make a grating coupler.
35 Citations
15 Claims
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1. A light scattering element for an optical waveguide with a core,
where the core of the optical waveguide is comprised of: -
a slab of monocrystalline silicon, a first layer of dielectric material disposed on the slab of monocrystalline silicon, and a strip of monocrystalline silicon disposed on the first layer of dielectric material, where the strip and a silicon body of a transistor are formed from the same monocrystalline silicon on the same substrate, and the light scattering element is comprised of; a second layer of dielectric material disposed on the strip of monocrystalline silicon, where the second layer of dielectric material and a gate oxide for a transistor are formed at the same time of the same dielectric material, a layer of polysilicon disposed on the second layer of dielectric material, where the layer of polysilicon and a polysilicon gate for a transistor are formed at the same time from the same polysilicon, and a cladding comprised of a plurality of dielectric materials, where the cladding is disposed over; the core of the waveguide, the second layer of dielectric materials and the layer of polysilicon, and at least one of the plurality of dielectric materials is comprised of a layer of salicide block used during the fabrication of a transistor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification