Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate
First Claim
1. A gas supply system arranged for dispensing of gas at predetermined flow rate, comprising a gas source vessel characterized by decline in gas pressure during dispensing of gas therefrom when the gas source vessel is in a low inventory state, and gas dispensing flow circuitry coupled to said vessel, wherein the gas dispensing flow circuitry is arranged for dispensing gas at selectively variable gas flow conductance conditions, to maintain said predetermined flow rate of the dispensed gas in the operation of the system, and increasing the gas flow conductance of the gas dispensing flow circuitry to compensate for said decline in gas pressure during dispensing of gas from the gas source vessel when the gas source vessel is in a low inventory state, to maintain said predetermined flow rate, wherein the gas dispensing flow circuitry comprises a single point of entrance in fluid communication with an array of flow passages wherein all the flow passages comprise a flow control valve to open or block flow through the respective flow passage and each of the flow passages excepting one comprises a restrictive orifice having a fixed and different diameter relative to an adjacent orifice, wherein the one exception flow passage does not include a flow occlusion element and has the highest gas flow conductance of said flow passages.
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Accused Products
Abstract
A gas supply system arranged for dispensing of gas at a predetermined flow rate. The system employs a gas dispensing flow circuitry arranged for dispensing gas at selectively variable gas flow conductance conditions, to maintain the flow rate of the dispensed gas at a predetermined, e.g., constant, value in the operation of the system. The gas dispensing flow circuitry may include an array of dispensed gas flow passages, each of a differing conductance, or alternatively a variable conductance gas flow passage equipped with a variable conductance assembly for modulating the gas flow conductance of the passage, in response to sensed pressure of the gas or other system parameter. The system permits the flow rate of a dispensed gas to be maintained at a consistent desired level, despite the progressive decline in source gas pressure as the gas source vessel is depleted in use.
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Citations
26 Claims
- 1. A gas supply system arranged for dispensing of gas at predetermined flow rate, comprising a gas source vessel characterized by decline in gas pressure during dispensing of gas therefrom when the gas source vessel is in a low inventory state, and gas dispensing flow circuitry coupled to said vessel, wherein the gas dispensing flow circuitry is arranged for dispensing gas at selectively variable gas flow conductance conditions, to maintain said predetermined flow rate of the dispensed gas in the operation of the system, and increasing the gas flow conductance of the gas dispensing flow circuitry to compensate for said decline in gas pressure during dispensing of gas from the gas source vessel when the gas source vessel is in a low inventory state, to maintain said predetermined flow rate, wherein the gas dispensing flow circuitry comprises a single point of entrance in fluid communication with an array of flow passages wherein all the flow passages comprise a flow control valve to open or block flow through the respective flow passage and each of the flow passages excepting one comprises a restrictive orifice having a fixed and different diameter relative to an adjacent orifice, wherein the one exception flow passage does not include a flow occlusion element and has the highest gas flow conductance of said flow passages.
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25. A gas supply system arranged for dispensing of gas at predetermined flow rate, comprising a gas source vessel characterized by decline in gas pressure during dispensing of gas therefrom when the gas source vessel is in a low inventory state, and gas dispensing flow circuitry coupled to said vessel, wherein the gas dispensing flow circuitry is physisorbing medium has a sorptive affinity for the dispensed gas, arranged so that the extent of the physical adsorption of the gas on the physisorbing medium is a calibrated function of pressure of the dispensed gas.
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26. A method of dispensing gas at a predetermined flow rate from a gas source vessel characterized by decline in gas pressure during dispensing of gas therefrom when the gas source vessel is in a low inventory state, comprising dispensing said gas under selectively variable gas flow conductance conditions, wherein gas flow conductance is selectively varied during dispensing to maintain said predetermined flow rate of the dispensed gas, and increasing the gas flow conductance during gas dispensing to compensate for said decline in gas pressure during dispensing of gas when the gas source vessel is in a low inventory state, to maintain said predetermined flow rate, wherein said gas flow conductance is selectively varied during dispensing by flowing the dispensed gas successively through different flow paths, wherein said different flow paths have different gas flow conductance relative to one another, wherein a highest gas flow conductance one of said different flow paths has no flow occlusion element therein and each of the others of said different flow paths has a restricted flow orifice therein.
Specification