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Lithographic apparatus, device manufacturing method, and device manufactured thereby

  • US 6,999,161 B2
  • Filed: 11/26/2003
  • Issued: 02/14/2006
  • Est. Priority Date: 11/27/2002
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system configured to provide a pulsed beam of radiation;

    a programmable patterning structure configured to pattern the pulsed beam according to a desired pattern;

    a projection system configured to project the patterned beam onto a target portion of a substrate;

    a positioning structure configured to move the substrate relative to the projection system during exposure by the patterned beam; and

    an optical structure configured to move the projected beam relative to the projection system during at least one pulse of the pulsed beam such that the projected beam is shifted in synchronism with the movement of the substrate during said at least one pulse.

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