Breakdown-resistant thin film capacitor with interdigitated structure
First Claim
1. A thin film capacitor comprising a carrier substrate (1), at least two interdigitated electrodes (4, 5), and at least one dielectric (3), characterized in that at least one interdigitated electrode (4) is arranged below the dielectric (3), at least one interdigitated electrode (5) is arranged above the dielectric (3) and the interdigitated electrode (5) above the dielectric (3) is positioned in a staggered, non-overlapping, arrangement with respect to the interdigitated electrode (4) below the dielectric (3).
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Abstract
The invention relates to a thin film capacitor with a carrier substrate, at least two interdigitated electrodes, and a dielectric. A staggered arrangement of at least one interdigitated electrode below the dielectric with respect to an interdigitated electrode above the dielectric results in a breakdown-resistant thin film capacitor which can be manufactured in the same production process as a standard monolayer capacitor.
74 Citations
4 Claims
- 1. A thin film capacitor comprising a carrier substrate (1), at least two interdigitated electrodes (4, 5), and at least one dielectric (3), characterized in that at least one interdigitated electrode (4) is arranged below the dielectric (3), at least one interdigitated electrode (5) is arranged above the dielectric (3) and the interdigitated electrode (5) above the dielectric (3) is positioned in a staggered, non-overlapping, arrangement with respect to the interdigitated electrode (4) below the dielectric (3).
Specification