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Breakdown-resistant thin film capacitor with interdigitated structure

  • US 6,999,297 B1
  • Filed: 01/18/2000
  • Issued: 02/14/2006
  • Est. Priority Date: 01/20/1999
  • Status: Expired due to Fees
First Claim
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1. A thin film capacitor comprising a carrier substrate (1), at least two interdigitated electrodes (4, 5), and at least one dielectric (3), characterized in that at least one interdigitated electrode (4) is arranged below the dielectric (3), at least one interdigitated electrode (5) is arranged above the dielectric (3) and the interdigitated electrode (5) above the dielectric (3) is positioned in a staggered, non-overlapping, arrangement with respect to the interdigitated electrode (4) below the dielectric (3).

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