Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
a patterning array including individually controllable elements that impart the projection beam with a pattern, each of the individually controllable elements include a cell containing a polar fluid, a non-polar fluid, an electrode, and a voltage source;
a substrate table that supports a substrate during an exposure operation; and
a projection system that projects the patterned beam onto a target portion of the substrate.
2 Assignments
0 Petitions
Accused Products
Abstract
A lithographic apparatus includes a patterning device that patterns a projected beam. The patterning device includes an array of cells that contain a polar fluid, a non-polar fluid, and an electrode. A potential difference across the electrode and the polar fluid causes displacement of the non-polar fluid. Based on a difference in refractive index between the polar fluid and the non-polar fluid, a beam of light which passes through the cell will have its phase changed in dependence on the relative thickness on the polar and non-polar fluids and on their refractive indices.
-
Citations
10 Claims
-
1. A lithographic apparatus, comprising:
-
an illumination system that supplies a projection beam of radiation; a patterning array including individually controllable elements that impart the projection beam with a pattern, each of the individually controllable elements include a cell containing a polar fluid, a non-polar fluid, an electrode, and a voltage source; a substrate table that supports a substrate during an exposure operation; and a projection system that projects the patterned beam onto a target portion of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A device manufacturing method, comprising:
-
forming each of individually controllable elements in an array of individually controllable elements with a cell containing a polar fluid, a non-polar fluid, an electrode, and a voltage source; using the array of individually controllable elements to impart a projection beam with a pattern; and projecting the patterned beam of radiation onto a target portion of a substrate. - View Dependent Claims (10)
-
Specification