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Method and apparatus for depositing films

  • US 7,011,733 B2
  • Filed: 06/01/2004
  • Issued: 03/14/2006
  • Est. Priority Date: 04/12/1996
  • Status: Expired due to Fees
First Claim
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1. An apparatus for depositing film on a substrate, the apparatus comprising:

  • a deposition chamber adapted to hold target particles and other particles;

    an ionizer adapted to create an ionization zone to selectively ionize the target particles passing through the ionization zone while leaving the other particles passing through the ionization zone substantially unaffected; and

    an electrostatic collimator adapted to electrically steer the ionized target particles through the electrostatic collimator and toward the substrate.

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