Plasma treatment system
First Claim
1. An apparatus for treating a workpiece with plasma, comprising:
- a vacuum chamber having a chamber base and a chamber lid movable relative to said chamber base between a closed position that defines a processing space and an open position for transferring a workpiece into and out of said processing space, said chamber lid including a first sidewall section capable of being removed from said chamber lid for changing a vertical dimension of said vacuum chamber;
a vacuum port in said vacuum chamber for evacuating said processing space;
a workpiece holder located in said processing space;
a process gas supply port in said vacuum chamber for introducing a process gas to said processing space; and
a plasma excitation source operable to provide a plasma in said processing space from the process gas.
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Accused Products
Abstract
A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.
49 Citations
10 Claims
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1. An apparatus for treating a workpiece with plasma, comprising:
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a vacuum chamber having a chamber base and a chamber lid movable relative to said chamber base between a closed position that defines a processing space and an open position for transferring a workpiece into and out of said processing space, said chamber lid including a first sidewall section capable of being removed from said chamber lid for changing a vertical dimension of said vacuum chamber; a vacuum port in said vacuum chamber for evacuating said processing space; a workpiece holder located in said processing space; a process gas supply port in said vacuum chamber for introducing a process gas to said processing space; and a plasma excitation source operable to provide a plasma in said processing space from the process gas. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification