Vacuum package fabrication of integrated circuit components
First Claim
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1. A method for manufacturing an integrated circuit device lid, comprising the steps of:
- forming at least one lid cavity on a surface of a lid wafer, the lid wafer having a sealing surface;
forming at least one sealing structure on the lid wafer disposed around one of the at least one cavities, each sealing structure including a bonding adhesion structure coupled to the sealing surface of the lid wafer and a bonding layer coupled to the bonding adhesion structure such that the bonding layer is at least substantially separated from the sealing surface of the lid wafer by the bonding adhesion structure; and
forming at least one at least substantially continuous trench in the sealing surface of the lid wafer and disposed around the cavity and between the cavity and the sealing structure, the trench being defined in part by a pair of side walls extending at least substantially continuously around the cavity.
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Abstract
A method for manufacturing integrated circuit device lids includes creating a lid cavity on the surface of a lid wafer, forming a sealing surface on the lid wafer that surrounds the lid cavity, and forming a trench on the lid wafer between the lid cavity and the sealing surface. The resulting structure uptakes excess sealing surface material and prevents such material from entering the lid cavity.
15 Citations
14 Claims
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1. A method for manufacturing an integrated circuit device lid, comprising the steps of:
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forming at least one lid cavity on a surface of a lid wafer, the lid wafer having a sealing surface; forming at least one sealing structure on the lid wafer disposed around one of the at least one cavities, each sealing structure including a bonding adhesion structure coupled to the sealing surface of the lid wafer and a bonding layer coupled to the bonding adhesion structure such that the bonding layer is at least substantially separated from the sealing surface of the lid wafer by the bonding adhesion structure; and forming at least one at least substantially continuous trench in the sealing surface of the lid wafer and disposed around the cavity and between the cavity and the sealing structure, the trench being defined in part by a pair of side walls extending at least substantially continuously around the cavity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification