Method for manufacturing liquid crystal display device with particular pad protection layers

• US 7,016,009 B2
• Filed: 06/29/2001
• Issued: 03/21/2006
• Est. Priority Date: 08/26/2000
• Status: Expired due to Term

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Philips LCD Company Limited (LG Display Co., Ltd.)
• Inventors: Lee, Jea Gu
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): Rude, Timothy L.
• Application Number:
  US09/894,881
• Publication Number:
  US 20020044238A1
• Time in Patent Office: 1,726 Days
• Field of Search: 349/110, 349/111, 349/152
• US Class Current: 349/187
• CPC Class Codes: G02F 1/13458 Terminal pads
• CPC Class Codes: G02F 1/136209 Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
• CPC Class Codes: G02F 1/136222 Colour filters incorporated in the active matrix substrate

Abstract

A method of manufacturing an LCD panel that avoids erosion of a transparent conductive film. The method includes forming a TFT substrate with an active region and with a pad region having a transparent conductive film. The TFT substrate is covered with a light-shielding material. That light shielding material is patterned to form a black matrix in the active region and an erosion barrier film over the transparent conductive film in the pad region. Beneficially, the black matrix and the erosion barrier film are formed of the same material, using the same mask. Color filters are electrodeposited from an aqueous solution without erosion of the transparent conductive film in the pad region.

Claims

1. A method of manufacturing an LCD panel, comprising:

forming a TFT substrate having an active region and a pad region, wherein the active region has a signal line and a signal electrode, and the pad region has a signal pad having an electrical connecting portion;

forming a light-shielding material layer over the active region and the pad region;

patterning the light-shielding material layer to form a matrix pattern in the active region and an erosion barrier film in the pad region, wherein the erosion barrier film substantially covers the electrical connecting portion of the signal pad and is formed as an island separated from the matrix pattern; and

forming a color filter in the active region after patterning the light-shielding material layer.

2. The method of claim 1, wherein the TFT substrate is formed by:

forming a thin film transistor, including a drain electrode, in the active region;

forming a passivation film over the active region and the pad region;

removing sections of the passivation film to form the electrical connecting portion of the signal pad and to form a contact hole that exposes the drain electrode; and

forming both a pixel electrode in the active region, wherein the pixel electrode electrically connects to the drain electrode, and a transparent conductive film on the signal pad.

3. The method of claim 2, wherein the signal line is formed to receive gate signals.

4. The method of claim 2, wherein the signal line is formed to receive data signals.

5. The method of claim 1, wherein the color filter is formed by electrodeposition.

6. The method of claim 1, wherein forming the light-shielding material layer includes depositing an organic material.

7. The method of claim 6, wherein the erosion barrier film is comprised of a same material as the matrix pattern.

8. The method of claim 1, wherein patterning the light-shielding material layer forms both the matrix pattern and the erosion barrier film with one mask.

9. The method of claim 1, wherein patterning the light-shielding material layer forms a black matrix.

10. An LCD panel, comprising:

a TFT substrate having an active region, a gate pad region having a first electrical connecting portion, and a data pad region having a second electrical connecting portion;

a matrix pattern in said active region;

a first erosion barrier film substantially covering the first electrical connecting portion in said gate pad region;

a second erosion barrier film substantially covering the second electrical connecting portion in said data pad region, wherein the matrix pattern is made of the same material as the first and second erosion barrier films and the first and second erosion barrier films are formed as an island separated from the matrix pattern; and

color filters in said active region.

11. An LCD panel according to claim 10, wherein said TFT substrate includes:

a gate line and a gate electrode in said active region, and a gate pad in said gate pad region;

a gate insulating film over said gate line, over said gate electrode, over said gate pad, and over exposed surfaces of said TET substrate;

a semiconductor layer on said gate insulating film and over said gate electrode;

a data line in said active region and on said gate insulating film;

source and drain electrodes on said semiconductor layer; and

a data pad in said data pad region.

12. An LCD panel according to claim 11, wherein said first erosion barrier film is over said gate pad, said wherein said second erosion barrier film is over said data pad.

13. An LCD panel according to claim 11, wherein said TFT substrate includes a pixel electrode electrically connected to said drain electrode.

14. An LCD panel according to claim 10, wherein said matrix pattern forms a black matrix.

15. An LCD panel according to claim 14, wherein said color filters are disposed in openings of said black matrix.

16. A method of manufacturing an LCD panel, comprising:

forming a TFT substrate having a gate line, a data line, a thin film transistor and a pixel electrode in an active region and a data pad and a gate pad in a pad region, wherein the thin film transistor includes a drain electrode and a source electrode on a semiconductor layer;

forming a light-shielding material layer over the TFT substrate;

removing the light-shielding material layer where a color filter and a sealant are to be located to form a matrix pattern in the active region and an erosion barrier film in the pad region, wherein the light-shielding material layer substantially remains over the data pad and the gate pad and the erosion barrier film is formed as an island separated from the matrix pattern;

electrodepositing the color filter, wherein the light-shielding material layer remaining substantially over the data pad and gate pad prevents the data pad and gate pad from being exposed to an aqueous solution during the electro-deposition of the color filter;

locating the sealant on the TET substrate;

attaching an opposing substrate to the TFT substrate; and

interposing a liquid crystal layer between the TFT substrate and the opposing substrate.

17. The method of claim 16, wherein forming the TFT substrate includes:

forming the gate line, a gate electrode, and the gate pad;

forming a gate insulating film over the gate line, over the gate electrode, and over the gate pad;

forming the semiconductor layer on the gate insulating film and over the gate electrode;

forming the data line and the data pad on the gate insulting layer, and forming the source electrode and the drain electrode on the semiconductor layer; and

forming the pixel electrode such that it is electrically connected to the drain electrode and forming transparent conductive films that are electrically connected to the gate pad and to the data pad.

18. The method of claim 16, wherein the color filter is electrodeposited from an aqueous solution.