Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
an array of individually controllable elements that pattern the projection beam;
a projection system that projects the patterned beam onto a target proportion of a substrate; and
a controller that limits a proportion of the array of individually controllable elements that is used to generate the patterned beam for at least one of a plurality of sub-exposures that are used to expose a repeating pattern on the substrate, such that a sum of sizes of said sub-exposures, in a given direction, equals a size of the repeating pattern exposed on the substrate, in said direction.
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Abstract
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
30 Citations
20 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a projection beam of radiation; an array of individually controllable elements that pattern the projection beam; a projection system that projects the patterned beam onto a target proportion of a substrate; and a controller that limits a proportion of the array of individually controllable elements that is used to generate the patterned beam for at least one of a plurality of sub-exposures that are used to expose a repeating pattern on the substrate, such that a sum of sizes of said sub-exposures, in a given direction, equals a size of the repeating pattern exposed on the substrate, in said direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A device manufacturing method, comprising:
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patterning a projection beam using an array of individually controllable elements; projecting the patterned projection beam at a target proportion of a substrate; and limiting a proportion of the array of individually controllable elements that is used to generate the patterned projection beam for at least one of a plurality of sub-exposures that are used to expose a repeating pattern on the substrate. - View Dependent Claims (16, 17)
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18. A computer program product for controlling a lithographic apparatus comprising a computer useable medium having a computer program logic recorded thereon for controlling at least one processor, the computer program logic comprising:
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computer program code means for patterning a projection beam using an array of individually controllable elements; computer program code means for projecting the patterned projection beam at a target proportion of a substrate; and computer program code means for causing the lithographic apparatus to limit a proportion of the array of individually controllable elements that is used to generate a patterned beam of radiation for at least one of a plurality of sub-exposures that are used to expose a repeating pattern on a substrate. - View Dependent Claims (19, 20)
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Specification