Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
an array of individually controllable elements that patterns the projection beam;
a projection system that projects the patterned beam onto a target portion of a substrate on a substrate table; and
a substrate displacement control system that (1) displaces the substrate relative to the substrate table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate and (2) determines the position of the substrate relative to the substrate table and the projection beam, the displacement control system comprising;
at least one component that is displaceable with the substrate, anda positioning apparatus to place the at least one component in contact with the substrate, such that (1) the at least one component is displaced with the substrate as the patterned beam is scanned across the substrate and (2) the at least one component is removed from the substrate after the patterned beam has been scanned across the substrate.
1 Assignment
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Accused Products
Abstract
A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate. The component could be, for example, an elongate strip carrying alignment marks or a magnet which is used to apply a displacement force to the substrate.
24 Citations
34 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a projection beam of radiation; an array of individually controllable elements that patterns the projection beam; a projection system that projects the patterned beam onto a target portion of a substrate on a substrate table; and a substrate displacement control system that (1) displaces the substrate relative to the substrate table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate and (2) determines the position of the substrate relative to the substrate table and the projection beam, the displacement control system comprising; at least one component that is displaceable with the substrate, and a positioning apparatus to place the at least one component in contact with the substrate, such that (1) the at least one component is displaced with the substrate as the patterned beam is scanned across the substrate and (2) the at least one component is removed from the substrate after the patterned beam has been scanned across the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A device manufacturing method, comprising:
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(a) patterning a projection beam of radiation with an array of individually controllable elements; (b) projecting the patterned projection beam onto a target portion of a substrate on a table; (c) displacing the substrate relative to the table and the projection system in a predetermined direction using a displacement system, such that the patterned projection beam is scanned across the substrate and the position of the substrate relative to the table and the projection system is determined; and (d) displacing at least one component of the displacement system with the substrate, the at least one component being placed in contact with the substrate so as to be displaced with the substrate as the patterned projection beam is scanned across the substrate and being removed from the substrate after the patterned projection beam has been scanned across the substrate. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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Specification