Controlled phase delay between beams for writing bragg gratings

• US 7,018,745 B2
• Filed: 01/09/2003
• Issued: 03/28/2006
• Est. Priority Date: 05/29/1998
• Status: Expired due to Fees

• Current Assignee: University of Sydney
• Original Assignee: University of Sydney
• Inventors: Sceats, Mark, Stepanov, Dmitrii
• Primary Examiner(s): Angebranndt, Martin
• Application Number:
  US10/338,884
• Publication Number:
  US 20030124438A1
• Time in Patent Office: 1,174 Days
• Field of Search: 430/1, 430/2, 430/290, 430/945, 385/37
• US Class Current: 430/1
• CPC Class Codes: G02B 2006/02157 Grating written during drawing of the fibre
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 6/02133 using beam interference
• CPC Class Codes: G02B 6/02138 based on illuminating a phase mask
• CPC Class Codes: G02B 6/02152 involving moving the fibre or a manufacturing element, stretching of the fibre G02B6/02147 takes precedence
• CPC Class Codes: G03H 1/0476 Holographic printer G03H1/268 takes precedence
• CPC Class Codes: G03H 2001/0482 Interference based printer
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

A method of writing an extended grating structure in a photosensitive waveguide comprising the steps of utilizing at least two overlapping beams of light to form an interference pattern, moving the waveguide through said overlapping beams, simultaneously controlling a relative phase delay between the beams utilising a phase modulator, thereby controlling the positions of maxima within said interference pattern to move at approximately the same velocity as the photosensitive waveguide, wherein the phase modulator does not comprise a mechanical means for effecting the phase modulation, and modifying the relative phase delay between the beams during the writing of the grating structure, whereby a deliberate detuning of the velocity of the positions of maxima within said interference pattern and the velocity of the photosensitive waveguide is utilized to vary a period of the written grating structure in the photosensitive waveguide.

Claims

1. A method of writing an extended grating structure in a photosensitive waveguide comprising:

utilising at least two overlapping beams of light to form an interference pattern,

moving the waveguide through an overlap region defined by said overlapping beams,

simultaneously varying the phase of at least one of the beams relative to at least one of the other beams utilising a phase modulator,

thereby variably controlling the velocity of the maxima within said interference pattern so that such velocity is different from the velocity of the photosensitive waveguide within the overlap region for the duration of the writing, excluding any periods of velocity change when the velocity of said maxima momentarily equals the velocity of the waveguide, wherein;

the phase modulator comprises a non-mechanical means for effecting the phase modulation, and

variation of the velocity of the maxima within the overlap region relative to the photosensitive waveguide is utilised to vary at least one of the phase, amplitude and period properties of at least a portion of the extended grating structure in the photosensitive waveguide.

2. A method as claimed in claim 1, wherein the at least two overlapping beams are formed by the splitting of a single coherent beam of light.

3. A method as claimed in claim 2, wherein the steps of varying the relative phase delay is performed before the splitting of the single coherent beam.

4. A method as claimed in claim 2, wherein the steps of varying the relative phase delay is performed after the splitting of the single coherent beam.

5. A method as claimed in claim 2, wherein the steps of varying the relative phase delay is performed in the process of the splitting of the single coherent beam.

6. A method as claimed in claim 2, wherein the method further comprises, after the splitting of the single coherent beam, the step of reflecting said beams at a series of reflection elements for effecting the overlapping of the beams to form the interference pattern.

7. A method as claimed in claim 1, wherein said modulator comprises one or more of a group comprising an electro-optic phase modulator, a magneto-optic phase modulator, a frequency shifter, an acousto-optic frequency shifter, a controllable optical retarder, and an optical delay line.

8. A method as claimed in claim 1, further comprising utilising a feedback loop in varying the relative phase delay to improve the noise properties of the grating structure.

9. A method as claimed in claim 8, wherein the feedback loop comprises an opto-electronic feedback loop.

10. A method as claimed in claim 1, wherein the grating structure comprises a chirped grating and/or an apodized grating.

11. A method as claimed in claim 1, wherein the grating structure has one or more of a group comprising a predetermined amplitude profile, a predetermined period profile, and a predetermined phase profile.

12. A method as claimed in claim 1, wherein the two beams have substantially orthogonal polarization states and wherein the modulator modulates the relative phase delay between the polarization states and wherein the method further comprises the step of aligning the polarization states of the beams subsequent to varying the relative phase delay for forming the interference pattern.

13. A method as claimed in claim 12, wherein the two beams having the substantially orthogonal polarization states initially from a single beam of light, and a polarization splitter element is utilised to separate the two beams from each other.

14. A method as claimed in claim 13, wherein the modulator varies the relative phase delay between the polarisation states in the single beam.

15. A method as claimed in claim 1, wherein a complete grating structure is written in a single continuous exposure step.