In-situ surfactant and chemical oxidant flushing for complete remediation of contaminants and methods of using same
DCFirst Claim
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1. A method for substantially removing subsurface contaminants, comprising the step of:
- introducing an effective amount of at least one preselected surfactant solution, wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and linear alkyl diphenyloxide disulfonate, wherein the effective amount of the at least one preselected surfactant is capable of substantially removing subsurface contaminants.
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Abstract
The present invention relates to removal of subsurface contaminants and methods of same. In more particular, but not by way of limitation, the present invention relates to an integrated method for remediating subsurface contaminants through the use of a low concentration surfactant solution (and methods of making and using novel surfactant solutions) followed by an abiotic polishing process to thereafter achieve a substantially reduced subsurface contaminant concentration that surfactant flushing alone cannot achieve.
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10 Claims
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1. A method for substantially removing subsurface contaminants, comprising the step of:
introducing an effective amount of at least one preselected surfactant solution, wherein the preselected surfactant solution is a mixture of sodium dioctylsulfosuccinate and linear alkyl diphenyloxide disulfonate, wherein the effective amount of the at least one preselected surfactant is capable of substantially removing subsurface contaminants. - View Dependent Claims (5, 6, 7, 8, 9, 10)
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2. A method for substantially expediting subsurface remediation of contaminants comprising the steps of:
introducing at least one surfactant capable of remediating at least one subsurface contaminant, wherein the surfactant is a mixture of sodium dioctylsulfosuccinate and linear alkyl diphenyloxide disulfonate. - View Dependent Claims (3, 4)
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