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Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object

  • US 7,022,937 B2
  • Filed: 12/30/2003
  • Issued: 04/04/2006
  • Est. Priority Date: 01/06/2003
  • Status: Expired due to Fees
First Claim
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1. A plasma processing method for processing a linear portion of an object to be processed by generating a linear plasma by supplying an electric power to an electrode provided at a plasma source or the object while supplying gas to the plasma source arranged in a neighborhood of the object and making activated particles generated by the linear plasma act on the object, the method comprising:

  • detecting an inclination of the plasma source along a direction of an x-axis when the x-axis is taken in a linear direction of the linear portion of the object; and

    processing the linear portion of the object with the generated linear plasma by moving the plasma source along the x-axis direction while maintaining relative positions of the plasma source and the object with respect to a distance between the plasma source and the object so that the detected inclination of the plasma source becomes approximately zero.

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